镓和氮晶格中的辐射诱导缺陷对 n-GaN 传导性补偿的影响

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
V. V. Kozlovski, A. E. Vasil’ev, A. A. Lebedev, E. E. Zhurkin, M. E. Levinshtein, A. M. Strelchuk, D. A. Malevsky, A. V. Sakharov, A. E. Nikolaev
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引用次数: 0

摘要

在15 mev质子和0.9 mev电子的照射下,对氮化镓镓亚晶格和氮亚晶格的辐射诱导缺陷形成进行了对比分析。使用SRIM软件对质子减速进行数值模拟,而对电子进行分析计算。分析表明,在质子辐照下,镓亚晶格的总空位生成率ηFP(Ga)约为560 cm-1,而氮亚晶格的总空位生成率ηFP(N)约为1340 cm-1。使用全级联模式的详细数值计算表明,由于质子在镓亚晶格中的空位形成率为110 cm-1,另外由级联过程产生的空位形成率为450 cm-1。在氮亚晶格中,这种差异更加明显,其中60 cm-1归因于直接质子相互作用,1280 cm-1归因于级联过程。在电子辐照下,镓亚晶格的空位生成率ηFP(Ga)约为4.7 cm-1,氮亚晶格的空位生成率ηFP(N)约为2.0 cm-1。为了实验研究氮化氮化镓的辐射诱导缺陷,记录了基于氮化氮化镓的肖特基二极管的正向电流-电压特性。分析表明,电子辐照下n-GaN的载流子去除率为0.47 cm-1,质子辐照下为150 cm-1。通过对辐射缺陷形成的计算参数和实验参数的比较,可以深入了解补偿机制和导致这一过程的辐射缺陷。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Effect of Radiation-Induced Defects in Gallium and Nitrogen Lattices on n-GaN Conductivity Compensation

Effect of Radiation-Induced Defects in Gallium and Nitrogen Lattices on n-GaN Conductivity Compensation

A comparative analysis of radiation-induced defect formation in the gallium and nitrogen sublattices of gallium nitride is conducted under irradiation by 15-MeV protons and 0.9-MeV electrons. Numerical modeling using the SRIM software is performed for proton deceleration, while analytical calculations are applied for electrons. The analysis shows that, under proton irradiation, the total vacancy-generation rate in the gallium sublattice ηFP(Ga) is approximately 560 cm–1, while in the nitrogen sublattice, ηFP(N) is approximately 1340 cm–1. Detailed numerical calculations using the Full Cascade mode indicate that the vacancy-formation rate due to protons in the gallium sublattice is 110 cm–1, with an additional 450 cm–1 generated by cascade processes. In the nitrogen sublattice, this disparity is even more pronounced, with 60 cm–1 attributed to direct proton interaction and 1280 cm–1 to cascade processes. Under electron irradiation, the vacancy-generation rate in the gallium sublattice ηFP(Ga) is approximately 4.7 cm–1, while in the nitrogen sublattice, ηFP(N) is approximately 2.0 cm–1. For the experimental study of radiation-induced defects in n-GaN, which create deep levels and compensate for the material’s conductivity, the forward current–voltage characteristics of Schottky diodes based on n-GaN are recorded. The analysis demonstrates that the charge-carrier removal rates in n-GaN are 0.47 cm–1 under electron irradiation and 150 cm–1 under proton irradiation. A comparison of the calculated and experimental parameters of radiation-induced defect formation provides insights into the compensation mechanism and the radiation-induced defects responsible for this process.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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