修正：在表面敏感模式下，对聚丙烯衬底上的PECVD siox薄膜的AFM-IR研究。

IF 2.6 4区材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY

Beilstein Journal of Nanotechnology Pub Date : 2025-02-20 eCollection Date: 2025-01-01 DOI:10.3762/bjnano.16.19

Hendrik Müller, Hartmut Stadler, Teresa de Los Arcos, Adrian Keller, Guido Grundmeier

引用次数: 0

摘要

[这更正了文章DOI: 10.3762/bjnano.15.51.]。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Correction: AFM-IR investigation of thin PECVD SiO _x films on a polypropylene substrate in the surface-sensitive mode.

[This corrects the article DOI: 10.3762/bjnano.15.51.].

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来源期刊

Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY

CiteScore

5.70

自引率

3.20%

发文量

109

审稿时长

2 months

期刊介绍： The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.