基于316L不锈钢原位生长的氮掺杂石墨碳纳米管网络的高灵敏度和选择性检测抗坏血酸和尿酸

IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY
Rui Lei , Wei Liu , Na Liu , Lanlan Ye , Junfu Zhang , Haiyang Li , Zihao Wang , Wenlei Hu , Mengyang Lv , Zaijiao Fei
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引用次数: 0

摘要

针对抗坏血酸(AA)和尿酸(UA)共存探针,构建了一种新型氮掺杂石墨碳纳米管(N-GCNNs)电化学传感器。通过化学气相沉积、热处理和水热法在不锈钢(SS)衬底上原位生长了N-GCNNs。这些N-GCNNs被用作电化学测定AA和UA的工作电极。循环伏安法和差分脉冲伏安法研究表明,N-GCNNs对AA的线性检测范围为100 ~ 3000 μM,检测限为1 μM;对UA的检测限为10 ~ 150 μM,检测限为0.5 μM。此外,这些N-GCNNs由于大量的边缘平面暴露位点和非均相电子转换速率的增加而表现出优异的选择性、再现性和稳定性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A highly sensitive and selective detection of ascorbic acid and uric acid based on nitrogen-doped graphitic carbon nanotube networks in situ grown on 316L stainless steel
A new electrochemical sensor concerning nitrogen-doped graphitic carbon nanotube networks (N-GCNNs) is constructed for a coexistent probe of ascorbic acid (AA) and uric acid (UA). The N-GCNNs are in situ grown on stainless steel (SS) substrate through chemical vapor deposition, heat treatment and hydrothermal method. These N-GCNNs are utilized as working electrodes to determine AA and UA electrochemically. From cyclic voltammetry and differential pulse voltammetry studies, the N-GCNNs can identify AA with wide rectilineal detection ranges from 100 to 3000 μM with a detection limit of 1 μM and determine UA from 10 to 150 μM with a detection limit of 0.5 μM. Furthermore, these N-GCNNs exhibit exceptional selectivity, reproducibility and stability owing to a great number of exposed edge plane sites and the increase of the heterogeneous electron transform rate.
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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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