Jaime Segura-Ruiz, Valentina Bonino, Martin Rosenthal, Nicolas Pauc, Vincent Calvo, Marvin Frauenrath, Clement Cardoux, Jean-Michel Hartmann, Alexei Chelnokov, Vincent Reboud
{"title":"纳米尺度下GeSn中热致锡偏析的动力学研究","authors":"Jaime Segura-Ruiz, Valentina Bonino, Martin Rosenthal, Nicolas Pauc, Vincent Calvo, Marvin Frauenrath, Clement Cardoux, Jean-Michel Hartmann, Alexei Chelnokov, Vincent Reboud","doi":"10.1016/j.jallcom.2025.179435","DOIUrl":null,"url":null,"abstract":"Tin segregation can hinder the use of Ge<sub>1-x</sub>Sn<sub>x</sub> in devices. A good understanding of this phenomenon is necessary to avoid this undesired phenomenon. Using Ge<sub>0.83</sub>Sn<sub>0.17</sub> micro-disks as a model system, the origin and dynamics of tin segregation during thermal annealing was studied at the nanometer scale. Temperature-steps annealing showed that the onset of segregation occurred at temperatures typically 90°C-95°C higher than the growth temperatures. Interrupted annealing using short 450°C pulses evidenced that segregation always started at single spots and propagated over the entire micro-disk surface in a few seconds. The spatial correlation between dislocations and segregation suggested that such defects were the initiators of such a process. Reducing the density of dislocations in the Ge<sub>1-x</sub>Sn<sub>x</sub> layers should limit tin segregation during thermal annealing, facilitating the integration of this alloy into technological processes requiring temperatures well above the layers’ growth temperature.","PeriodicalId":344,"journal":{"name":"Journal of Alloys and Compounds","volume":"31 1","pages":""},"PeriodicalIF":6.3000,"publicationDate":"2025-02-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Dynamics of Thermal-Induced Sn segregation in GeSn at the Nanometer Scale\",\"authors\":\"Jaime Segura-Ruiz, Valentina Bonino, Martin Rosenthal, Nicolas Pauc, Vincent Calvo, Marvin Frauenrath, Clement Cardoux, Jean-Michel Hartmann, Alexei Chelnokov, Vincent Reboud\",\"doi\":\"10.1016/j.jallcom.2025.179435\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Tin segregation can hinder the use of Ge<sub>1-x</sub>Sn<sub>x</sub> in devices. A good understanding of this phenomenon is necessary to avoid this undesired phenomenon. Using Ge<sub>0.83</sub>Sn<sub>0.17</sub> micro-disks as a model system, the origin and dynamics of tin segregation during thermal annealing was studied at the nanometer scale. Temperature-steps annealing showed that the onset of segregation occurred at temperatures typically 90°C-95°C higher than the growth temperatures. Interrupted annealing using short 450°C pulses evidenced that segregation always started at single spots and propagated over the entire micro-disk surface in a few seconds. The spatial correlation between dislocations and segregation suggested that such defects were the initiators of such a process. Reducing the density of dislocations in the Ge<sub>1-x</sub>Sn<sub>x</sub> layers should limit tin segregation during thermal annealing, facilitating the integration of this alloy into technological processes requiring temperatures well above the layers’ growth temperature.\",\"PeriodicalId\":344,\"journal\":{\"name\":\"Journal of Alloys and Compounds\",\"volume\":\"31 1\",\"pages\":\"\"},\"PeriodicalIF\":6.3000,\"publicationDate\":\"2025-02-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Alloys and Compounds\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1016/j.jallcom.2025.179435\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Alloys and Compounds","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1016/j.jallcom.2025.179435","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
Dynamics of Thermal-Induced Sn segregation in GeSn at the Nanometer Scale
Tin segregation can hinder the use of Ge1-xSnx in devices. A good understanding of this phenomenon is necessary to avoid this undesired phenomenon. Using Ge0.83Sn0.17 micro-disks as a model system, the origin and dynamics of tin segregation during thermal annealing was studied at the nanometer scale. Temperature-steps annealing showed that the onset of segregation occurred at temperatures typically 90°C-95°C higher than the growth temperatures. Interrupted annealing using short 450°C pulses evidenced that segregation always started at single spots and propagated over the entire micro-disk surface in a few seconds. The spatial correlation between dislocations and segregation suggested that such defects were the initiators of such a process. Reducing the density of dislocations in the Ge1-xSnx layers should limit tin segregation during thermal annealing, facilitating the integration of this alloy into technological processes requiring temperatures well above the layers’ growth temperature.
期刊介绍:
The Journal of Alloys and Compounds is intended to serve as an international medium for the publication of work on solid materials comprising compounds as well as alloys. Its great strength lies in the diversity of discipline which it encompasses, drawing together results from materials science, solid-state chemistry and physics.