非热等离子体射流增强Au/PSi/n-Si/Ag异质结光电探测器性能:设计及等离子体电压的影响

IF 3.3 3区 材料科学 Q3 CHEMISTRY, PHYSICAL
Silicon Pub Date : 2025-01-07 DOI:10.1007/s12633-024-03208-0
Noor Dhaief Hayif, Hasan A. Hadi, Intesar H. Hashim
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引用次数: 0

摘要

我们研究了非热等离子体射流(NTPJ)对通过光电化学蚀刻(PECE)制备的多孔硅(Psi)纳米结构的影响,随后研究了这种影响对基于Psi的光电探测器性能的影响,其中非热等离子体射流对多孔硅表面的影响在任何先前的研究中都没有被检查过。采用非热等离子体射流对PSi样品分别施加12、14和16 kV电压,固定时间为12 min。x射线衍射(XRD)结果表明,当等离子体电压升高到16 kV时,多孔硅晶体的尺寸从28.6 nm增加到75.0 nm。场发射扫描电镜(FE-SEM)图像显示,灰色的、泥状的、深色的多孔样品变成了一个趋向黑色的更多孔的表面,等离子体处理只改变了多孔层的顶部表面,而没有对样品造成任何损伤。原子力显微镜(AFM)图像研究表明,在16 kV等离子体电压下处理后,多孔硅的表面粗糙度RMS、平均粗糙度Sa和前10个最高粗糙度Sz分别从1.50、1.10和13.7 nm增加到5.21、3.69和64.59 nm。处理后材料的拉曼散射光谱显示出由于等离子体处理多孔硅PSi而产生的可见光致发光和红外位移,具有548 cm−1的晶体结构带。等离子体处理后的光致发光(PL)光谱显示出多峰,并向更长的波长偏移。Au/PSi/n-Si/Ag光电探测器的响应率随等离子体电压的增加而增加,在16 kV时达到最高值(480和600 nm处分别为9.28和10.83 W/A),在480和600 nm处的最大探测率分别为2.47 × 1012和2.8 × 1012琼斯。基于可重复性和光响应速度对光电探测器的性能进行了评价。对Au/PSi/n-Si/Ag异质结光电探测器在-1 V偏置电压和4 s开关周期下的稳定性进行了测试,显示出恒定的最大电流值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhancement of Performance Au/PSi/n-Si/Ag Heterojunction Photodetector by Non-thermal Plasma Jet: Design and Impact of Plasma Voltage

We have investigated the impact of non-thermal plasma jet (NTPJ) on porous silicon (Psi) nanostructures prepared by photoelectrochemical etching (PECE) and subsequently studied this effect on the performance of the PSi-based photodetectors, where the influence of a non-thermal plasma jet on a porous silicon surface has not been examined in any previous study. PSi samples were treated with 12, 14, and 16 kV voltages by a non-thermal plasma jet for a fixed fluence duration of 12 min. The X-ray diffraction (XRD) pattern reveals that the size of porous silicon crystallized increased from 28.6 nm to 75.0 nm when the plasma voltage was raised to 16 kV. Field emission scanning electron microscopes (FE-SEM) images revealed that the gray, mud-like, and dark porous sample turned into a tending black and more porous surface, and the treatment by plasma altered the top surface of the porous layer only without causing any damage to the sample. The study of atomic force microscopy (AFM) images showed that the surface roughness RMS, roughness average Sa, and the top ten highest roughness Sz of porous silicon increased from 1.50, 1.10, and 13.7 nm to 5.21, 3.69, and 64.59 nm, respectively, after treated at 16 kV plasma voltage. Raman scattering spectra of treated materials show visible photoluminescence and an infrared shift due to plasma treatment of porous silicon PSi, with a crystalline structure band at 548 cm−1. The photoluminescence (PL) spectrum shows multiple peaks and shifts toward longer wavelengths after plasma treatment. The responsivity of Au/PSi/n-Si/Ag photodetectors increases with plasma voltage, reaching its highest values at 16 kV (9.28 and 10.83 W/A at 480 and 600 nm) and the maximum detectivity of 2.47 × 1012 and 2.8 × 1012 Jones at 480 and 600 nm. Photodetectors performance was evaluated based on repeatability and photo response speed. The stability of Au/PSi/n-Si/Ag, heterojunction photodetectors, was tested at -1 V bias voltage and 4 s switch cycle, demonstrating constant maximum current values.

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来源期刊
Silicon
Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.90
自引率
20.60%
发文量
685
审稿时长
>12 weeks
期刊介绍: The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.
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