铜蒸气在石墨烯生长中的催化作用。

IF 4.6 2区 化学 Q2 CHEMISTRY, PHYSICAL
Yuan Chang, Shiji Li, Tianyu He, Hongsheng Liu, Junfeng Gao
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引用次数: 0

摘要

铜是在接近熔点的温度下生长单层石墨烯最常用的衬底。在本研究中,我们阐述了大量的Cu团簇在石墨烯生长过程中连续蒸发,从而产生与CH4相当的蒸汽压。重要的是,CH4在Cu簇上的分解势垒与Cu表面的相似甚至更低。在复杂中间体中,CuCH4是主要的活性簇,具有促进生长的作用。特别是在第一层石墨烯覆盖之后,它可能通过提供关键生长物质而成为多层生长的主要催化因素。通过可控的种子掺入,该机制有望实现双层和多层石墨烯结构的大面积可控生长。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Copper Vapor Catalyzing Role in the Growth of Graphene.

Cu is the most used substrate to grow monolayer graphene under a temperature near the melting point. In this study, we elaborated a remarkable amount of Cu clusters were continuously evaporated during the graphene growth, resulting in the vapor pressure comparable with the CH4. Importantly, the decomposition barrier of CH4 on Cu clusters is similar to or even lower than that on the Cu surface. CuCH4 serves as the primary active cluster in complex intermediates, exhibiting a growth-promoting effect. Particularly after the first graphene layer coverage, it may emerge as a dominant catalytic factor for multilayer growth by supplying critical growth species. Through controlled seed incorporation, this mechanism is expected to enable large-area controllable growth of bilayer and multilayer graphene structures.

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来源期刊
The Journal of Physical Chemistry Letters
The Journal of Physical Chemistry Letters CHEMISTRY, PHYSICAL-NANOSCIENCE & NANOTECHNOLOGY
CiteScore
9.60
自引率
7.00%
发文量
1519
审稿时长
1.6 months
期刊介绍: The Journal of Physical Chemistry (JPC) Letters is devoted to reporting new and original experimental and theoretical basic research of interest to physical chemists, biophysical chemists, chemical physicists, physicists, material scientists, and engineers. An important criterion for acceptance is that the paper reports a significant scientific advance and/or physical insight such that rapid publication is essential. Two issues of JPC Letters are published each month.
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