减轻电子脉冲辐射损伤的分子动力学研究

IF 2.2 3区 工程技术 Q1 MICROSCOPY
Wenyan Zhao , Peng Wu , Rui Xu , Zhuangzhi Li , Huanxin Yang , Chunhui Zhu , Jianqi Li
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引用次数: 0

摘要

减少辐射损害是电子显微镜学家的长期目标,特别是那些从事生物和有机物研究的人。最近,在超快透射电子显微镜下,电子脉冲已经被证明是一种辐射敏感材料的损伤缓解技术。然而,减缓效应的潜在机制仍不清楚。在这项研究中,我们利用二元弹性碰撞框架下的分子动力学模拟研究了脉冲电子对石墨烯的辐射损伤。对于200 keV的电子辐照,发现脉冲电子束的阈值角(1.4 rad)比随机电子束的阈值角(1.0 rad)大。这是因为通过使用控制良好的电子脉冲,可以防止两个电子与同一原子或相邻原子短暂地相互作用。虽然这种辐射损伤的减轻仅在阈值角附近明显,并且可能存在其他减少机制,但我们的研究结果为电子脉冲的辐射损伤减轻提供了见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Molecular dynamics study on the mitigation of radiation damage caused by electron pulses
The reduction of radiation damage represents a long-term objective for electron microscopists, particularly those engaged in the study of biological and organic matter. Recently, electron pulses in ultrafast transmission electron microscopy have been demonstrated to serve as a damage mitigation technique for radiation-sensitive materials. Nevertheless, the underlying mechanism of the mitigation effects remains unclear. In this study, we investigate the radiation damage of graphene induced by pulsed electrons using molecular dynamics simulations within the framework of binary elastic collisions. For electron irradiation at 200 keV, it was found that the pulsed electron beam corresponds to a larger threshold angle (1.4 rad) than that for a random beam (1.0 rad). This is because two electrons can be prevented from briefly interacting with the same or a neighboring atom by the use of well-controlled electron pulses. While such a mitigation of radiation damage is only apparent near the threshold angle, and there are likely other reduction mechanisms, our results provide insight into the mitigated radiation damage of electron pulses.
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来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
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