还原氧化石墨烯:二硫化钼纳米片复合膜中的温度依赖电子传输

IF 2.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Nikita V. Kurnosov, Alexander M. Plokhotnichenko, Victor A. Karachevtsev
{"title":"还原氧化石墨烯:二硫化钼纳米片复合膜中的温度依赖电子传输","authors":"Nikita V. Kurnosov,&nbsp;Alexander M. Plokhotnichenko,&nbsp;Victor A. Karachevtsev","doi":"10.1007/s00339-025-08302-7","DOIUrl":null,"url":null,"abstract":"<div><p>Composites formed by reduced graphene oxide (rGO) and molybdenum disulfide (MoS2) are considered promising for applications such as nanoelectronics, electrochemical sensors, and catalysis. In this work, the temperature dependence of resistance R(T) of rGO-MoS<sub>2</sub> composite film was measured in the 5–290 K range and compared with that obtained for rGO film. It was found that the R(T) dependence of the rGO-MoS<sub>2</sub> composite film showed semiconducting behavior as the resistance increased at temperature lowering. The analysis of the R(T) dependence revealed that at low temperatures (from 5 to 166 K) the electron transport in the composite is governed by Efros-Shklovskii variable range hopping model (ES VRH). The higher temperature range (from 166 K to room temperature) was described in the framework of the 2D Mott VRH model as well as power-law dependence. Fitting the R(T) dependence of rGO-MoS<sub>2</sub> composite to curves calculated from these models allowed us to estimate the parameters of the electron transport such as localization length, density of localized states, and the width of the Coulomb gap. The values of these parameters are slightly different from those obtained for the rGO film. This small difference, similarity in the behavior of R(T) dependences, and applicability of the same transport models for rGO-MoS<sub>2</sub> and rGO samples indicate that electron transport in the composite is determined by the inherent conductivity of rGO nanosheets while the presence of MoS<sub>2</sub> nanoflakes can affect their ordering, local dielectric environment and thus electron transport parameters.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 3","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-02-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Temperature-dependent electron transport in a composite film of reduced graphene oxide:MoS2 nanoflakes\",\"authors\":\"Nikita V. Kurnosov,&nbsp;Alexander M. Plokhotnichenko,&nbsp;Victor A. Karachevtsev\",\"doi\":\"10.1007/s00339-025-08302-7\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Composites formed by reduced graphene oxide (rGO) and molybdenum disulfide (MoS2) are considered promising for applications such as nanoelectronics, electrochemical sensors, and catalysis. In this work, the temperature dependence of resistance R(T) of rGO-MoS<sub>2</sub> composite film was measured in the 5–290 K range and compared with that obtained for rGO film. It was found that the R(T) dependence of the rGO-MoS<sub>2</sub> composite film showed semiconducting behavior as the resistance increased at temperature lowering. The analysis of the R(T) dependence revealed that at low temperatures (from 5 to 166 K) the electron transport in the composite is governed by Efros-Shklovskii variable range hopping model (ES VRH). The higher temperature range (from 166 K to room temperature) was described in the framework of the 2D Mott VRH model as well as power-law dependence. Fitting the R(T) dependence of rGO-MoS<sub>2</sub> composite to curves calculated from these models allowed us to estimate the parameters of the electron transport such as localization length, density of localized states, and the width of the Coulomb gap. The values of these parameters are slightly different from those obtained for the rGO film. This small difference, similarity in the behavior of R(T) dependences, and applicability of the same transport models for rGO-MoS<sub>2</sub> and rGO samples indicate that electron transport in the composite is determined by the inherent conductivity of rGO nanosheets while the presence of MoS<sub>2</sub> nanoflakes can affect their ordering, local dielectric environment and thus electron transport parameters.</p></div>\",\"PeriodicalId\":473,\"journal\":{\"name\":\"Applied Physics A\",\"volume\":\"131 3\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-02-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Physics A\",\"FirstCategoryId\":\"4\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s00339-025-08302-7\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics A","FirstCategoryId":"4","ListUrlMain":"https://link.springer.com/article/10.1007/s00339-025-08302-7","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

由还原氧化石墨烯(rGO)和二硫化钼(MoS2)组成的复合材料被认为在纳米电子学、电化学传感器和催化等领域有很好的应用前景。本文测量了rGO- mos2复合薄膜电阻R(T)在5-290 K范围内的温度依赖性,并与rGO薄膜的电阻R(T)进行了比较。结果表明,随着温度的降低,rGO-MoS2复合薄膜的R(T)依赖性表现为半导体行为。R(T)依赖性分析表明,在低温(5 ~ 166 K)下,复合材料中的电子输运受Efros-Shklovskii变范围跳变模型(ES VRH)控制。在二维Mott VRH模型框架中描述了较高的温度范围(从166 K到室温)以及幂律依赖性。将rGO-MoS2复合材料的R(T)依赖性与这些模型计算的曲线拟合,使我们能够估计电子输运的参数,如局域化长度、局域态密度和库仑隙宽度。这些参数的值与还原氧化石墨烯薄膜的值略有不同。这种微小的差异和相似的R(T)依赖行为,以及相同输运模型对rGO-MoS2和rGO样品的适用性表明,复合材料中的电子输运是由rGO纳米片的固有电导率决定的,而MoS2纳米片的存在会影响它们的有序、局部介电环境和电子输运参数。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Temperature-dependent electron transport in a composite film of reduced graphene oxide:MoS2 nanoflakes

Composites formed by reduced graphene oxide (rGO) and molybdenum disulfide (MoS2) are considered promising for applications such as nanoelectronics, electrochemical sensors, and catalysis. In this work, the temperature dependence of resistance R(T) of rGO-MoS2 composite film was measured in the 5–290 K range and compared with that obtained for rGO film. It was found that the R(T) dependence of the rGO-MoS2 composite film showed semiconducting behavior as the resistance increased at temperature lowering. The analysis of the R(T) dependence revealed that at low temperatures (from 5 to 166 K) the electron transport in the composite is governed by Efros-Shklovskii variable range hopping model (ES VRH). The higher temperature range (from 166 K to room temperature) was described in the framework of the 2D Mott VRH model as well as power-law dependence. Fitting the R(T) dependence of rGO-MoS2 composite to curves calculated from these models allowed us to estimate the parameters of the electron transport such as localization length, density of localized states, and the width of the Coulomb gap. The values of these parameters are slightly different from those obtained for the rGO film. This small difference, similarity in the behavior of R(T) dependences, and applicability of the same transport models for rGO-MoS2 and rGO samples indicate that electron transport in the composite is determined by the inherent conductivity of rGO nanosheets while the presence of MoS2 nanoflakes can affect their ordering, local dielectric environment and thus electron transport parameters.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信