缩放后的hf0.5 zr0.5 o2基铁电电容器中氧空位分布及相组成

IF 3.6 2区 物理与天体物理 Q2 PHYSICS, APPLIED
T. Iung, L. Pérez Ramírez, A. Gloskovskii, C.-Yi Cho, M.-Y. Lao, S. De, T.-H Hou, C. Lubin, M. Gros-Jean, N. Barrett
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引用次数: 0

摘要

在本文中,我们研究了薄膜厚度、相组成和氧空位(VO)分布之间的相关性,这是实现低工作电压、更高续航能力和先进节点集成所必需的。利用x射线光电子能谱、硬x射线光电子能谱、掠入射x射线衍射和电学表征,研究了6 nm和10 nm厚度的Hf0.5Zr0.5O2 (HZO)薄膜的相组成和VO谱的演变。我们证明,随着界面处VO浓度的增加,更薄的薄膜呈现出更大比例的非极性四方相(t相),从而影响器件性能。电测量显示了两种厚度之间的唤醒和疲劳行为的对比,在场循环过程中,由于t相优势和VO再分布,较薄的薄膜显示出减少的剩余极化(2PR)。这些发现强调了应变、相位稳定性和VO动力学的关键相互作用,为优化基于hzo的fecap提供了关键见解,用于先进的低功耗存储器应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Oxygen vacancy distribution and phase composition in scaled, Hf0.5Zr0.5O2-based ferroelectric capacitors
In this paper, we address correlations between film thickness, phase composition, and oxygen vacancy (VO) distribution in scaled, hafnia-based ferroelectric capacitors (FeCAPs), necessary to achieve low operating voltages, higher endurance, and advanced node integration. Using x-ray photoelectron spectroscopy, hard x-ray photoelectron spectroscopy, grazing incidence x-ray diffraction, and electrical characterization, we investigate the evolution of phase composition and VO profiles in Hf0.5Zr0.5O2 (HZO) films of 6 and 10 nm thickness. We demonstrate that thinner films exhibit a greater fraction of the non-polar tetragonal phase (t-phase), with increased VO concentration at the interface, affecting the device performance. Electrical measurements reveal contrasting wake-up and fatigue behavior between the two thicknesses, with thinner films showing decreased remanent polarization (2PR) due to t-phase dominance and VO redistribution during field cycling. These findings highlight the critical interplay of strain, phase stability, and VO dynamics, providing key insights for the optimization of HZO-based FeCAPs for advanced, low-power memory applications.
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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