γ-Al2O3负载KCl选择性吸附气态氧化汞:制备及吸附机理

IF 1.4 4区 工程技术 Q3 ENGINEERING, CHEMICAL
Jiangyi Tong, Haiyang Li, Rui Jin, Xiaoshuo Liu, Haitao Hu, Yufeng Duan, Xiuyuan Ma, Li Zhong, Lipeng Han
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引用次数: 0

摘要

选择吸附剂分离Hg0和HgCl2是汞形态检测的关键。KCl是常用的,但其表面积有限,寿命短,吸附Hg0/HgCl2的机理尚不清楚。因此,提出了用γ-Al2O3负载KCl制备高表面积选择性吸附剂来提高实际性能,并通过实验研究和密度泛函理论(DFT)计算阐明了Hg0和HgCl2的选择性吸附机理。与纯KCl相比,KCl/γ-Al2O3对HgCl2表现出明显的选择性吸附效果,当KCl与γ-Al2O3摩尔比为1时,Hg0的选择性吸附率接近于完全突破,这主要归功于其良好的孔隙度和分散的活性位点。DFT结果证实KCl和Hg0之间存在弱范德华力,表明存在物理吸附,而KCl和HgCl2之间存在共价键,表明存在化学吸附。高分辨率透射电子显微镜(HRTEM)在开发的吸附剂上鉴定了001和011的两个晶体表面。这阐明了三种稳定的吸附构型:001 Top-Cl、011 Top-Cl和011 Cl-Cl桥,吸附能分别为- 87.11、- 110.74和- 174.91 kJ/mol。电子结构和相互作用区指示(IRI)分析表明,HgCl2内部的Hg原子与KCl表面的不饱和Cl原子形成共价键。此外,集成晶体轨道汉密尔顿居群(ICOHP)分析和电子转移结果表明,三种构型与HgCl2的相互作用强度依次为011 Cl-Cl桥>; 011 Top-Cl > 001 Top-Cl。这与HgCl2 (HgCl2- tpd)程序升温解吸过程中276℃、231℃和120℃三个不同的温度峰相匹配。该研究为汞在Hg0和HgCl2之间的形态划分提供了新的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
KCl supported by γ-Al2O3 for selective adsorption of gaseous oxidized mercury: Preparation and adsorption mechanism

The separation of Hg0 and HgCl2 with selective adsorbents is crucial for mercury speciation detection. KCl is commonly used but has a limited surface area, a short lifespan, and an unclear mechanism for Hg0/HgCl2 adsorption. Hence, KCl supported by γ-Al2O3 to create a high-surface-area selective adsorbent to enhance practical performance was proposed and the selective adsorption mechanisms of Hg0 and HgCl2 through experimental investigations and density functional theory (DFT) calculations were elucidated. Compared to the total breakthrough of pure KCl, that of KCl/γ-Al2O3 exhibits markedly selective adsorption efficacy on HgCl2, with a nearly complete breakthrough rate on Hg0 at a KCl-to-γ-Al2O3 molar ratio of 1, attributed to their favorable porosity and dispersed active sites. The DFT results verify a weak van der Waals force between KCl and Hg0, indicating physisorption, while covalent bonding occurs between KCl and HgCl2, suggesting chemisorption. High-resolution transmission electron microscopy (HRTEM) identifies two crystalline surfaces of 001 and 011 on the developed adsorbent. This clarifies three stable adsorption configurations: 001 Top-Cl, 011 Top-Cl, and 011 Cl–Cl bridge, with adsorption energies of −87.11, −110.74, and −174.91 kJ/mol, respectively. Analyses of the electronic structure and interaction region indicator (IRI) reveal that the Hg atom within HgCl2 forms covalent bonds with unsaturated Cl atoms on the KCl surface. Additionally, integrated crystal orbital Hamilton population (ICOHP) analysis and electron transfer results demonstrate that the interaction strength of the three configurations with HgCl2 follows the order of 011 Cl–Cl bridge > 011 Top-Cl > 001 Top-Cl. This matches the three different temperature peaks of 276, 231, and 120°C, respectively, in the analysis of the temperature-programmed desorption of HgCl2 (HgCl2-TPD). This study offers a novel insight on mercury speciation partitioning between Hg0 and HgCl2.

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来源期刊
自引率
11.10%
发文量
111
期刊介绍: Asia-Pacific Journal of Chemical Engineering is aimed at capturing current developments and initiatives in chemical engineering related and specialised areas. Publishing six issues each year, the journal showcases innovative technological developments, providing an opportunity for technology transfer and collaboration. Asia-Pacific Journal of Chemical Engineering will focus particular attention on the key areas of: Process Application (separation, polymer, catalysis, nanotechnology, electrochemistry, nuclear technology); Energy and Environmental Technology (materials for energy storage and conversion, coal gasification, gas liquefaction, air pollution control, water treatment, waste utilization and management, nuclear waste remediation); and Biochemical Engineering (including targeted drug delivery applications).
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