用frenkel类缺陷消除带边态:在无机化合物α-Ag2S中的应用

IF 2.7 Q2 PHYSICS, CONDENSED MATTER
Shuang Qiu , Hanyang Ji , Kaixuan Jin , Shuhan Tang , Xiaojie Liu
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引用次数: 0

摘要

消除杂质态是改善半导体材料性能的有效方法。在无机化合物α-Ag2S中插入Se或Te会在价带最大值(VBM)附近产生高度局域化的杂质态,即所谓的微扰宿主态(PHSs)。这些PHSs可能作为复合中心,影响载流子的输运。在此,我们提出了一种自补偿方法,通过引入frenkel类缺陷来消除PHSs。第一性原理计算证明了类frenkel缺陷,即间隙掺杂周围的一个第一近邻s -空位(V1S) (Sei + V1S或Tei + V1S)能够消除PHSs。类frenkel缺陷不仅可以实现对电子结构的补偿,还可以实现对载流子浓度的补偿。相反,过多的肖特基缺陷会导致部分补偿或过度补偿。此外,还发现类frenkel缺陷的存在可以降低地层能量,提高体系的稳定性。这一发现突出了弗伦克尔类缺陷在消除杂质态中的重要性,这与传统的主要归功于没有引入额外的外来元素的方案有根本的不同。我们的研究结果为其他半导体中消除杂质态的设计提供了新的途径。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Elimination of band-edge states by Frenkel-like defects: Application in inorganic compound α-Ag2S

Elimination of band-edge states by Frenkel-like defects: Application in inorganic compound α-Ag2S
The elimination of impurity states is an effective method to improve the properties of semiconductor material. Interstitial Se or Te doping in inorganic compound α-Ag2S would induce highly localized impurity states around the valence band maximum (VBM), which are so-called perturbed host states (PHSs). These PHSs possibly act as the recombination center and would affect the carrier transport. Herein, we propose the self-compensation method to eliminate the PHSs by introducing Frenkel-like defects. The first-principles calculations prove that the Frenkel-like defects, i.e., one first-nearest neighbor S-vacancy (V1S) around the interstitial dopant (Sei + V1S or Tei + V1S), are able to eliminate the PHSs. The Frenkel-like defect can not only achieve compensation for electronic structure, but also achieve compensation for carrier concentration. Instead, excessive Schottky defects would lead to partial compensation or overcompensation. Additionally, it is also found that the existence of Frenkel-like defect can lower the formation energy and improve the stability of the system. This discovery highlights the importance of Frenkel-like defects in eliminating impurity states, which is fundamentally different from the traditional scheme that mainly credits no introduction of additional foreign elements. Our results provide a new avenue to the design of eliminating impurity states in other semiconductors.
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CiteScore
6.50
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