交替溅射沉积法制备Fe和ge取代CZTS薄膜的光学和结构特性

IF 2.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Ming-Rong Dong, Yi-Qi Chen, Yan Zhu
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引用次数: 0

摘要

利用直流磁控溅射技术,结合cu₂ZnSnS₄(CZTS)和金属Fe(或Ge)靶材,通过交替溅射沉积工艺(CZTS/Fe/CZTS/Fe/CZTS),然后进行硫化,成功合成了Fe和Ge取代的CZTS薄膜。利用x射线衍射(XRD)、拉曼光谱(Raman spectroscopy)和紫外可见光谱(UV-Vis spectroscopy)对膜的相结构和光学性能进行了表征。结果表明,通过精确控制Fe和Ge层的厚度,可以制备出高质量的Fe和Ge取代CZTS薄膜。分析表明,铁取代提高了可见光谱长波区的吸光度。相反,Ge取代对长波区的吸光度没有显著影响,但会降低波长小于700 nm的吸光度。在50 nm范围内,可以通过Ge和Fe取代来实现带隙的调整。然而,过量的Fe和Ge可能导致二次相结构的形成,特别是FeS₂和SnS₂,而不会改变带隙。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Optical and structural properties of Fe- and Ge-substituted CZTS thin films produced by alternating sputtering deposition

Utilizing the DC magnetron sputtering technique in conjunction with a Cu₂ZnSnS₄ (CZTS) and metal Fe (or Ge) target through an alternating sputtering deposition process (CZTS/Fe/CZTS/Fe/CZTS) followed by vulcanization, we successfully synthesized Fe- and Ge-substituted CZTS thin films. The phase structure and optical properties of these films were characterized using X-ray diffraction (XRD), Raman spectroscopy, and UV-Vis spectroscopy. Our results indicate that by precisely controlling the thickness of the Fe and Ge interlayers, high-quality Fe- and Ge-substituted CZTS thin films can be produced. The analysis reveals that Fe substitution enhances absorbance in the long-wavelength region of the visible spectrum. Conversely, Ge substitution does not significantly affect absorbance in the long-wavelength region but decreases optical absorbance at wavelengths shorter than 700 nm. Adjustments in the band gap are achievable with Ge and Fe substitutions within a 50 nm range. However, an excess of Fe and Ge may result in the formation of secondary phase structures, specifically FeS₂ and SnS₂, without altering the band gap.

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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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