浮栅晶体管的分析与Verilog-A建模

IF 2.4 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Sayma Nowshin Chowdhury;Matthew Chen;Sahil Shah
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引用次数: 0

摘要

浮栅晶体管在标准CMOS工艺中提供非易失性模拟存储,在可重构系统芯片(soc)、可编程模拟结构、模拟神经网络和混合信号神经形态电路的发展中至关重要。这些电路的设计和制造通常涉及广泛的基于spice的模拟,但在制造后集成和校准浮栅晶体管是一种常见的做法。为了弥补这一差距,我们提出了一个基于经验测量的Verilog-A模型,该模型基于65纳米CMOS工艺制造的浮栅晶体管。该模型结合了热电子注入和Fowler-Nordheim隧道机制,能够准确预测保留时间,从而便于自适应外围电路的设计。我们的研究结果为优化浮栅晶体管提供了见解,以提高编程效率和减少面积消耗。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis and Verilog-A Modeling of Floating-Gate Transistors
Floating-gate transistors provide non-volatile analog storage in standard CMOS processes and are crucial in the development of reconfigurable Systems on Chips (SoCs), programmable analog structures, analog neural networks, and mixed-signal neuromorphic circuits. Designing and fabricating these circuits typically involves extensive SPICE-based simulations, yet integrating and calibrating floating-gate transistors post-fabrication is a common practice. To bridge this gap, we present a Verilog-A model based on empirical measurements for a floating-gate transistor fabricated using a 65 nm CMOS process. This model incorporates mechanisms for hot-electron injection and Fowler-Nordheim tunneling, and accurately predicts retention time, thus facilitating the design of adaptive peripheral circuits. Our findings offer insights into optimizing floating-gate transistors for enhanced programming efficiency and reduced area consumption.
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