In Situ Growth of Copper Channels within CuCl and PVDF Composite for Durable WORM Device Formation

This study details the creation of a write-once-read many (WORM) memory device utilizing cuprous chloride (CuCl) and poly(vinylidene fluoride-co-hexafluoropropylene) (PVDF–HFP) polymers. Employing an in-plane configuration, a deliberate 1:10 ratio of CuCl to PVDF–HFP has been selected. This ratio aims to establish an in situ copper channel within the device. The electrical response exhibits consistent memory retention over an extended duration. The WORM characteristics are attributed to the development of multiple conducting filaments or a highly conductive percolative path created by Cu ions within the polymer matrix. The UV–vis study also reinforces the obtained results. Additionally, the WORM undergoes specific poling and cooling conditions. The fabrication approach employed in this research yields a distinctive type of memory device. Once the device is activated, it maintains its state, even after the applied field is reduced. Their applications span legal, financial, healthcare, and archival purposes also, meeting stringent regulatory requirements and enhancing data integrity.