利用可持续建筑砌块芘开发深紫外正色调光刻胶

IF 7.2 2区材料科学 Q2 CHEMISTRY, PHYSICAL

Chemistry of Materials Pub Date : 2025-01-28 DOI:10.1021/acs.chemmater.4c02813

Yizhou Liu, Josua Markus, Han-Hao Cheng, Paul V. Bernhardt, Andrew K. Whittaker, Idriss Blakey, Craig M. Williams

{"title":"利用可持续建筑砌块芘开发深紫外正色调光刻胶","authors":"Yizhou Liu, Josua Markus, Han-Hao Cheng, Paul V. Bernhardt, Andrew K. Whittaker, Idriss Blakey, Craig M. Williams","doi":"10.1021/acs.chemmater.4c02813","DOIUrl":null,"url":null,"abstract":"The advancements in micro- and nanofabrication of semiconductor devices have led to a growing demand for innovative molecules to enhance photolithographic imaging materials. However, intensified production demands placed on deep ultraviolet (DUV) positive-tone chemically amplified resists, especially those based on polymethacrylates with alicyclic pendant groups, face increasing environmental challenges (e.g., nonsustainable monomer feedstocks). Disclosed herein is the synthesis of a series of methacrylic monomers and homopolymers derived from derivatives of the sustainable chemical building block dihydrolevoglucosenone (Cyrene, DLGO), obtained from renewable cellulose feedstocks. Poly(<i>n</i>-BuMDLGO) showed photoacid lability that modified the solubility upon treatment with basic developing solutions. This feature enabled photopatterning using both DUV (contact mask) and electron beam lithography.","PeriodicalId":33,"journal":{"name":"Chemistry of Materials","volume":"49 1","pages":""},"PeriodicalIF":7.2000,"publicationDate":"2025-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene\",\"authors\":\"Yizhou Liu, Josua Markus, Han-Hao Cheng, Paul V. Bernhardt, Andrew K. Whittaker, Idriss Blakey, Craig M. Williams\",\"doi\":\"10.1021/acs.chemmater.4c02813\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The advancements in micro- and nanofabrication of semiconductor devices have led to a growing demand for innovative molecules to enhance photolithographic imaging materials. However, intensified production demands placed on deep ultraviolet (DUV) positive-tone chemically amplified resists, especially those based on polymethacrylates with alicyclic pendant groups, face increasing environmental challenges (e.g., nonsustainable monomer feedstocks). Disclosed herein is the synthesis of a series of methacrylic monomers and homopolymers derived from derivatives of the sustainable chemical building block dihydrolevoglucosenone (Cyrene, DLGO), obtained from renewable cellulose feedstocks. Poly(<i>n</i>-BuMDLGO) showed photoacid lability that modified the solubility upon treatment with basic developing solutions. This feature enabled photopatterning using both DUV (contact mask) and electron beam lithography.\",\"PeriodicalId\":33,\"journal\":{\"name\":\"Chemistry of Materials\",\"volume\":\"49 1\",\"pages\":\"\"},\"PeriodicalIF\":7.2000,\"publicationDate\":\"2025-01-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Chemistry of Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1021/acs.chemmater.4c02813\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"CHEMISTRY, PHYSICAL\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chemistry of Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acs.chemmater.4c02813","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}

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摘要

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene

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Development of a Deep Ultraviolet Positive-Tone Photoresist from the Sustainable Building Block Cyrene

The advancements in micro- and nanofabrication of semiconductor devices have led to a growing demand for innovative molecules to enhance photolithographic imaging materials. However, intensified production demands placed on deep ultraviolet (DUV) positive-tone chemically amplified resists, especially those based on polymethacrylates with alicyclic pendant groups, face increasing environmental challenges (e.g., nonsustainable monomer feedstocks). Disclosed herein is the synthesis of a series of methacrylic monomers and homopolymers derived from derivatives of the sustainable chemical building block dihydrolevoglucosenone (Cyrene, DLGO), obtained from renewable cellulose feedstocks. Poly(n-BuMDLGO) showed photoacid lability that modified the solubility upon treatment with basic developing solutions. This feature enabled photopatterning using both DUV (contact mask) and electron beam lithography.

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来源期刊

Chemistry of Materials 工程技术-材料科学：综合

CiteScore

14.10

自引率

5.80%

发文量

929

审稿时长

1.5 months

期刊介绍： The journal Chemistry of Materials focuses on publishing original research at the intersection of materials science and chemistry. The studies published in the journal involve chemistry as a prominent component and explore topics such as the design, synthesis, characterization, processing, understanding, and application of functional or potentially functional materials. The journal covers various areas of interest, including inorganic and organic solid-state chemistry, nanomaterials, biomaterials, thin films and polymers, and composite/hybrid materials. The journal particularly seeks papers that highlight the creation or development of innovative materials with novel optical, electrical, magnetic, catalytic, or mechanical properties. It is essential that manuscripts on these topics have a primary focus on the chemistry of materials and represent a significant advancement compared to prior research. Before external reviews are sought, submitted manuscripts undergo a review process by a minimum of two editors to ensure their appropriateness for the journal and the presence of sufficient evidence of a significant advance that will be of broad interest to the materials chemistry community.