催化Cu2O/Cu位点平衡了碳中间体的偶联和蚀刻反应,用于二氧化碳辅助石墨烯合成

IF 12.1 2区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Small Pub Date : 2025-01-27 DOI:10.1002/smll.202410365
Yifan Zhu, Congcong Ning, Yan Jin, Qian Yang, Xiangnan Gong, Baoshan Hu
{"title":"催化Cu2O/Cu位点平衡了碳中间体的偶联和蚀刻反应,用于二氧化碳辅助石墨烯合成","authors":"Yifan Zhu,&nbsp;Congcong Ning,&nbsp;Yan Jin,&nbsp;Qian Yang,&nbsp;Xiangnan Gong,&nbsp;Baoshan Hu","doi":"10.1002/smll.202410365","DOIUrl":null,"url":null,"abstract":"<p>In the chemical vapor deposition (CVD) synthesis of graphene, the surficial chemical state of the metal substrate has exerted key roles in all elemental reaction steps determining the growth mechanism of graphene. Herein, a CO<sub>2</sub>-participated annealing procedure is designed to construct catalytic Cu<sub>2</sub>O/Cu sites on Cu foil for the graphene CVD synthesis with CO<sub>2</sub>/CH<sub>4</sub> as carbon sources. These Cu<sub>2</sub>O/Cu species can catalyze the CH<sub>4</sub> decomposition and subsequent C─C coupling to form C<sub>2</sub> intermediates for fast growth of monolayer hexagonal graphene domains with a diameter of ≈30 µm within 0.5 min. The graphene growth kinetics can be bidirectionally regulated merely with the variation of CO<sub>2</sub> flow rate during annealing and growth stages, in association with the Cu<sup>+</sup>/Cu<sup>0</sup> ratio, enabling simultaneous control over the size and shape of graphene domains. Density functional theory (DFT) calculations indicate that the catalytic Cu<sub>2</sub>O/Cu sites reduce the activation energy by ≈0.13 eV for the first dehydrogenation of CH<sub>4</sub>, allowing the growing rate of graphene driven by coupling of C<sub>2</sub> intermediates faster than their etching rate by O-containing <sup>*</sup>O and <sup>*</sup>OH species. The work provides novel insights into heterostructured nano-catalyst consisting of zero valent metal and variably valent metal oxide that facilitate the controllable synthesis of graphene materials.</p>","PeriodicalId":228,"journal":{"name":"Small","volume":"21 9","pages":""},"PeriodicalIF":12.1000,"publicationDate":"2025-01-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Catalytic Cu2O/Cu Site Trades off the Coupling and Etching Reactions of Carbon Intermediates for CO2-Assisted Graphene Synthesis\",\"authors\":\"Yifan Zhu,&nbsp;Congcong Ning,&nbsp;Yan Jin,&nbsp;Qian Yang,&nbsp;Xiangnan Gong,&nbsp;Baoshan Hu\",\"doi\":\"10.1002/smll.202410365\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>In the chemical vapor deposition (CVD) synthesis of graphene, the surficial chemical state of the metal substrate has exerted key roles in all elemental reaction steps determining the growth mechanism of graphene. Herein, a CO<sub>2</sub>-participated annealing procedure is designed to construct catalytic Cu<sub>2</sub>O/Cu sites on Cu foil for the graphene CVD synthesis with CO<sub>2</sub>/CH<sub>4</sub> as carbon sources. These Cu<sub>2</sub>O/Cu species can catalyze the CH<sub>4</sub> decomposition and subsequent C─C coupling to form C<sub>2</sub> intermediates for fast growth of monolayer hexagonal graphene domains with a diameter of ≈30 µm within 0.5 min. The graphene growth kinetics can be bidirectionally regulated merely with the variation of CO<sub>2</sub> flow rate during annealing and growth stages, in association with the Cu<sup>+</sup>/Cu<sup>0</sup> ratio, enabling simultaneous control over the size and shape of graphene domains. Density functional theory (DFT) calculations indicate that the catalytic Cu<sub>2</sub>O/Cu sites reduce the activation energy by ≈0.13 eV for the first dehydrogenation of CH<sub>4</sub>, allowing the growing rate of graphene driven by coupling of C<sub>2</sub> intermediates faster than their etching rate by O-containing <sup>*</sup>O and <sup>*</sup>OH species. The work provides novel insights into heterostructured nano-catalyst consisting of zero valent metal and variably valent metal oxide that facilitate the controllable synthesis of graphene materials.</p>\",\"PeriodicalId\":228,\"journal\":{\"name\":\"Small\",\"volume\":\"21 9\",\"pages\":\"\"},\"PeriodicalIF\":12.1000,\"publicationDate\":\"2025-01-27\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Small\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/smll.202410365\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"CHEMISTRY, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Small","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/smll.202410365","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

在化学气相沉积(CVD)合成石墨烯的过程中,金属衬底的表面化学状态在决定石墨烯生长机理的所有元素反应步骤中起着关键作用。本文设计了以CO2/CH4为碳源,在Cu箔上构建Cu2O/Cu催化位,用于石墨烯CVD合成。这些Cu2O/Cu物质可以催化CH4分解和随后的C─C耦合形成C2中间体,从而在0.5 min内快速生长直径约为30µm的单层六方石墨烯畴。石墨烯的生长动力学仅受退火和生长阶段CO2流速的变化以及Cu+/Cu0比的影响,从而可以同时控制石墨烯畴的大小和形状。密度泛函理论(DFT)计算表明,Cu2O/Cu催化位点使CH4第一次脱氢的活化能降低了约0.13 eV,使得C2中间体耦合驱动的石墨烯生长速度快于含O的*O和*OH物质的蚀刻速度。这项工作为零价金属和变价金属氧化物组成的异质结构纳米催化剂提供了新的见解,有助于石墨烯材料的可控合成。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Catalytic Cu2O/Cu Site Trades off the Coupling and Etching Reactions of Carbon Intermediates for CO2-Assisted Graphene Synthesis

Catalytic Cu2O/Cu Site Trades off the Coupling and Etching Reactions of Carbon Intermediates for CO2-Assisted Graphene Synthesis

Catalytic Cu2O/Cu Site Trades off the Coupling and Etching Reactions of Carbon Intermediates for CO2-Assisted Graphene Synthesis

In the chemical vapor deposition (CVD) synthesis of graphene, the surficial chemical state of the metal substrate has exerted key roles in all elemental reaction steps determining the growth mechanism of graphene. Herein, a CO2-participated annealing procedure is designed to construct catalytic Cu2O/Cu sites on Cu foil for the graphene CVD synthesis with CO2/CH4 as carbon sources. These Cu2O/Cu species can catalyze the CH4 decomposition and subsequent C─C coupling to form C2 intermediates for fast growth of monolayer hexagonal graphene domains with a diameter of ≈30 µm within 0.5 min. The graphene growth kinetics can be bidirectionally regulated merely with the variation of CO2 flow rate during annealing and growth stages, in association with the Cu+/Cu0 ratio, enabling simultaneous control over the size and shape of graphene domains. Density functional theory (DFT) calculations indicate that the catalytic Cu2O/Cu sites reduce the activation energy by ≈0.13 eV for the first dehydrogenation of CH4, allowing the growing rate of graphene driven by coupling of C2 intermediates faster than their etching rate by O-containing *O and *OH species. The work provides novel insights into heterostructured nano-catalyst consisting of zero valent metal and variably valent metal oxide that facilitate the controllable synthesis of graphene materials.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Small
Small 工程技术-材料科学:综合
CiteScore
17.70
自引率
3.80%
发文量
1830
审稿时长
2.1 months
期刊介绍: Small serves as an exceptional platform for both experimental and theoretical studies in fundamental and applied interdisciplinary research at the nano- and microscale. The journal offers a compelling mix of peer-reviewed Research Articles, Reviews, Perspectives, and Comments. With a remarkable 2022 Journal Impact Factor of 13.3 (Journal Citation Reports from Clarivate Analytics, 2023), Small remains among the top multidisciplinary journals, covering a wide range of topics at the interface of materials science, chemistry, physics, engineering, medicine, and biology. Small's readership includes biochemists, biologists, biomedical scientists, chemists, engineers, information technologists, materials scientists, physicists, and theoreticians alike.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信