Selective area molecular beam epitaxy of InSb on InP(111)B: from thin films to quantum nanostructures.

InSb is a material of choice for infrared as well as spintronic devices but its integration on large lattice mismatched semi-insulating III-V substrates has so far altered its exceptional properties. Here, we investigate the direct growth of InSb on InP(111)_Bsubstrates with molecular beam epitaxy. Despite the lack of a thick metamorphic buffer layer for accommodation, we show that quasi-continuous thin films can be grown using a very high Sb/In flux ratio. The quality of the films is further studied with Hall measurements on large-scale devices to assess the impact of the InSb surface and InSb/InP interface on the electronic properties. Taking advantage of the optimized growth conditions for the formation of thin films, the selective area molecular beam epitaxial growth of nanostructures is subsequently investigated. Based on cross-sectional transmission electron microscopy and scanning near-field optical microscopy in the middle-wave infrared, ultra-thin and very long in-plane InSb nanowires as well as more complex nanostructures such as nano-rings and crosses are achieved with a good structural quality.