{"title":"用扫描透射电子显微镜测量相对不确定度小于10-4的面间距的统计方法。","authors":"Amram Azulay , Itai Silber , Yoram Dagan , Amit Kohn","doi":"10.1016/j.micron.2025.103783","DOIUrl":null,"url":null,"abstract":"<div><div>Atomic-scale metrology in scanning transmission electron microscopy (STEM) allows to measure distances between individual atomic columns in crystals and is therefore an important aspect of their structural characterization. Furthermore, it allows to locally resolve strain in crystals and to calibrate precisely the pixel size in STEM. We present a method dedicated to the evaluation of interplanar spacing (d-spacing) based on an algorithm including curve fitting of processed high-angle annular dark-field STEM (HAADF STEM) signals. By examining simulated data of perovskite cubic SrTiO<sub>3</sub>, we confirm that our proposed method is unbiased, and the precision is better than the significant digit of the input value. Then, we study experimental data to learn how electron dose, sampling resolution, and statistical sampling affect the mean and precision values of <em>d</em><sub>110</sub>. For single d-spacing measurements using a probe corrected STEM, we find that uncertainty ranges between 1 and 3 pm. Here, we measure numerous d-spacings in an automated and statistical approach, resulting in relative uncertainties in mean values ≤ 10<sup>−4</sup>. Thus, we propose to calibrate TEMs using this method as it enables measuring lattice parameters at uncertainties comparable to reports of x-ray diffraction measurements, but with a significantly lower sample volume, in this case ∼ 10<sup>−3</sup> µm<sup>3</sup>.</div></div>","PeriodicalId":18501,"journal":{"name":"Micron","volume":"190 ","pages":"Article 103783"},"PeriodicalIF":2.5000,"publicationDate":"2025-01-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A statistical approach for interplanar spacing metrology at a relative uncertainty below 10−4 using scanning transmission electron microscopy\",\"authors\":\"Amram Azulay , Itai Silber , Yoram Dagan , Amit Kohn\",\"doi\":\"10.1016/j.micron.2025.103783\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>Atomic-scale metrology in scanning transmission electron microscopy (STEM) allows to measure distances between individual atomic columns in crystals and is therefore an important aspect of their structural characterization. Furthermore, it allows to locally resolve strain in crystals and to calibrate precisely the pixel size in STEM. We present a method dedicated to the evaluation of interplanar spacing (d-spacing) based on an algorithm including curve fitting of processed high-angle annular dark-field STEM (HAADF STEM) signals. By examining simulated data of perovskite cubic SrTiO<sub>3</sub>, we confirm that our proposed method is unbiased, and the precision is better than the significant digit of the input value. Then, we study experimental data to learn how electron dose, sampling resolution, and statistical sampling affect the mean and precision values of <em>d</em><sub>110</sub>. For single d-spacing measurements using a probe corrected STEM, we find that uncertainty ranges between 1 and 3 pm. Here, we measure numerous d-spacings in an automated and statistical approach, resulting in relative uncertainties in mean values ≤ 10<sup>−4</sup>. Thus, we propose to calibrate TEMs using this method as it enables measuring lattice parameters at uncertainties comparable to reports of x-ray diffraction measurements, but with a significantly lower sample volume, in this case ∼ 10<sup>−3</sup> µm<sup>3</sup>.</div></div>\",\"PeriodicalId\":18501,\"journal\":{\"name\":\"Micron\",\"volume\":\"190 \",\"pages\":\"Article 103783\"},\"PeriodicalIF\":2.5000,\"publicationDate\":\"2025-01-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Micron\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0968432825000010\",\"RegionNum\":3,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MICROSCOPY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Micron","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0968432825000010","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MICROSCOPY","Score":null,"Total":0}
A statistical approach for interplanar spacing metrology at a relative uncertainty below 10−4 using scanning transmission electron microscopy
Atomic-scale metrology in scanning transmission electron microscopy (STEM) allows to measure distances between individual atomic columns in crystals and is therefore an important aspect of their structural characterization. Furthermore, it allows to locally resolve strain in crystals and to calibrate precisely the pixel size in STEM. We present a method dedicated to the evaluation of interplanar spacing (d-spacing) based on an algorithm including curve fitting of processed high-angle annular dark-field STEM (HAADF STEM) signals. By examining simulated data of perovskite cubic SrTiO3, we confirm that our proposed method is unbiased, and the precision is better than the significant digit of the input value. Then, we study experimental data to learn how electron dose, sampling resolution, and statistical sampling affect the mean and precision values of d110. For single d-spacing measurements using a probe corrected STEM, we find that uncertainty ranges between 1 and 3 pm. Here, we measure numerous d-spacings in an automated and statistical approach, resulting in relative uncertainties in mean values ≤ 10−4. Thus, we propose to calibrate TEMs using this method as it enables measuring lattice parameters at uncertainties comparable to reports of x-ray diffraction measurements, but with a significantly lower sample volume, in this case ∼ 10−3 µm3.
期刊介绍:
Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.