SnO2纳米颗粒的微乳液合成及其在Au/n-Si/Al器件结构中的集成

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Zeynep Orhan, Elif Daş, Gamze Bozkurt
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引用次数: 0

摘要

本文报道了用微乳液法制备氧化锡纳米颗粒(SnO2)及其在不同操作条件下在n型Si半导体上的性能。采用XRD、SEM、TEM和UV-Vis等分析手段对SnO2的物理特性进行了表征。XRD分析表明,SnO2具有平均晶粒尺寸为14.4 nm的晶体结构。通过紫外可见分析确定SnO2的光学带隙能为3.4 eV。此外,在黑暗中测量Au/SnO2/n-Si/Al和Au/n-Si/Al器件的电流-电压(I-V)特性,以探索SnO2纳米材料对其电学参数的影响。通过I-V测量,SnO2/n-Si器件的整流比、饱和电流、理想因数和势垒高度分别为4.35 × 104(±2 V)、1.96 × 10-9 A、1.57和0.81 eV。对于SnO2/n-Si器件的电光特性,在可见光和紫外光(365 nm)条件下进行了I-V测量。与白光照明相比,SnO2/n-Si器件具有自供电特性,在紫外光下具有优越的开/关比、响应性和探测性。因此,我们可以断言,SnO2/n-Si器件在敏感光检测应用中具有重要的前景,特别是在紫外线敏感的光电器件中。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Microemulsion synthesis of SnO2 nanoparticles and their integration in Au/n-Si/Al device structure

This study reports the synthesis of tin (IV) oxide (SnO2) nanoparticles (NPs) using the micro-emulsion method and its performance on n-type Si semiconductors under various operating conditions. The physical characteristics of SnO2 were examined using XRD, SEM, TEM, and UV–Vis analysis. XRD analysis revealed that SnO2 has a crystalline structure with an average crystallite size of 14.4 nm. The optical band gap energy of SnO2 was determined as 3.4 eV using UV–Vis analysis. Additionally, the current–voltage (I–V) characteristics of the Au/SnO2/n-Si/Al and Au/n-Si/Al devices were measured in darkness to explore the influence of SnO2 nanomaterial on their electrical parameters. From the I–V measurements, the rectification ratio, saturation current, ideality factor, and barrier height values for the SnO2/n-Si device were determined to be 4.35 × 104 (at ± 2 V), 1.96 × 10–9 A, 1.57, and 0.81 eV, respectively. For electro-optical characteristics of the SnO2/n-Si device, the I–V measurements were conducted under both visible light and UV light (365 nm) conditions. The SnO2/n-Si device, featuring a self-powered property, exhibited superior ON/OFF ratio, responsivity, and detectivity under UV light compared to white light illumination. Therefore, we can assert that the SnO2/n-Si device holds significant promise for sensitive light detection applications, particularly in UV-sensitive optoelectronic devices.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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