Jihoon Keum, Kai-Xuan Zhang, Suik Cheon, Hyuncheol Kim, Jingyuan Cui, Giung Park, Yunyeong Chang, Miyoung Kim, Hyun-Woo Lee, Je-Geun Park
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引用次数: 0
摘要
无磁场的电荷电流磁化开关在器件应用和信息技术中是必不可少的。它通常需要电流诱导的面外自旋极化,这超出了传统铁磁体/重金属系统的能力,其中电流诱导的自旋极化与面内电荷电流和面外自旋电流在平面内正交。在这里,通过制造范德华磁体和氧化物Fe3GeTe2/SrTiO3异质结构,展示了一种新的无磁场开关方法。这种新的无磁场开关是可能的,因为电流驱动的自旋积累在Rashba界面上,在一个新兴的界面磁性周围进动,最终产生最终的面外自旋极化。平面内初始化磁场控制的开关极性变化具有明显的迟滞,进一步证实了这一解释。Van - der - Waals磁体和氧化物首次成功结合,特别是利用SrTiO3氧化物上的自旋轨道扭矩。这使得本研究建立了一种新的无磁场开关方式。这项工作展示了大自旋霍尔角材料和累积自旋进动的不同寻常的垂直开关应用,并由此为范德华磁体和氧化物自旋电子学开辟了一个新的领域和机会。
Novel Magnetic-Field-Free Switching Behavior in vdW-Magnet/Oxide Heterostructure
Magnetization switching by charge current without a magnetic field is essential for device applications and information technology. It generally requires a current-induced out-of-plane spin polarization beyond the capability of conventional ferromagnet/heavy-metal systems, where the current-induced spin polarization aligns in-plane orthogonal to the in-plane charge current and out-of-plane spin current. Here, a new approach is demonstrated for magnetic-field-free switching by fabricating a van-der-Waals magnet and oxide Fe3GeTe2/SrTiO3 heterostructure. This new magnetic-field-free switching is possible because the current-driven accumulated spins at the Rashba interface precess around an emergent interface magnetism, eventually producing an ultimate out-of-plane spin polarization. This interpretation is further confirmed by the switching polarity change controlled by the in-plane initialization magnetic fields with clear hysteresis. Van-der-Waals magnet and oxide are successfully combined for the first time, especially taking advantage of spin-orbit torque on the SrTiO3 oxide. This allows this study to establish a new way of magnetic field-free switching. This work demonstrates an unusual perpendicular switching application of large spin Hall angle materials and precession of accumulated spins, and in doing so, opens up a new field and opportunities for van-der-Waals magnets and oxide spintronics.
期刊介绍:
Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.