等离子体辅助化学气相沉积制备NiO纳米结构的可控性能

IF 4.3 2区化学 Q2 CHEMISTRY, MULTIDISCIPLINARY

Chemical Communications Pub Date : 2025-01-17 DOI:10.1039/d4cc06548d

Davide Barreca, Enrico Scattolin, Chiara Maccato, Alberto Gasparotto, Lorenzo Signorin, Naida El Habra, Andraž Šuligoj, Urška Lavrenčič Štangar, Gian Andrea Rizzi

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引用次数: 0

摘要

提出了一种新颖的等离子体辅助气相法在导电玻璃上低温制备负载型NiO纳米结构的方法。单一沉积时间的变化可以调整材料特性，进而调节系统的润湿性和光降解难降解污染物的功能性能。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition

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Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition

An original plasma assisted vapor phase route is proposed for the low-temperature fabrication of supported NiO nanostructures on conductive glasses. The sole deposition time variation enables to tailor material properties, modulating, in turn, the system wettability and functional performances in the photodegradation of recalcitrant pollutants.

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来源期刊

Chemical Communications 化学-化学综合

CiteScore

8.60

自引率

4.10%

发文量

2705

审稿时长

1.4 months

期刊介绍： ChemComm (Chemical Communications) is renowned as the fastest publisher of articles providing information on new avenues of research, drawn from all the world''s major areas of chemical research.