Yan Wang, Yizhang Guan, Chuang Zhang, Jiahe Cao, Xuanyan Chen, Qiangqiang Ouyang, Yew Hoong Wong, Guofeng Hu, Chee Keong Tan
{"title":"ε -Ga2O3中铟合金的极化和界面电荷调谐","authors":"Yan Wang, Yizhang Guan, Chuang Zhang, Jiahe Cao, Xuanyan Chen, Qiangqiang Ouyang, Yew Hoong Wong, Guofeng Hu, Chee Keong Tan","doi":"10.1063/5.0245828","DOIUrl":null,"url":null,"abstract":"Density functional theory was utilized to assess the influence of In alloying on the spontaneous (Psp) and piezoelectric (Ppe) polarization of ε-Ga2O3 heterostructures with In concentrations ranging from 0% to 50%. The analysis demonstrated a decrease in both Psp and Ppe with an increase in In concentration, described by the equations Psp = −9.5947x + 24.81 and Ppe = −0.6217x (where x represents the In concentration, with units in μC/cm2). Additionally, the polarization-induced two-dimensional electron gas (2DEG) density within ε-InGaO/ε-Ga2O3 heterostructures was examined using a one-dimensional Schrödinger–Poisson solver. An inverse correlation was observed between 2DEG density and epitaxial thickness across all undoped In-alloyed samples. Furthermore, achieving high 2DEG densities (exceeding 1013 cm−2) is significantly facilitated by n-type doping concentrations above 1017 cm−3 in ε-InGaO. These insights not only augment the understanding of polarization effects in ε-Ga2O3 heterostructures but also provide a strategic framework for enhancing 2DEG density in ε-Ga2O3-based devices, which offers significant potential for advancing ε-Ga2O3-based high electron mobility transistors for power and RF applications.","PeriodicalId":8094,"journal":{"name":"Applied Physics Letters","volume":"2 1","pages":""},"PeriodicalIF":3.5000,"publicationDate":"2025-01-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Indium alloying in ε -Ga2O3 for polarization and interfacial charge tuning\",\"authors\":\"Yan Wang, Yizhang Guan, Chuang Zhang, Jiahe Cao, Xuanyan Chen, Qiangqiang Ouyang, Yew Hoong Wong, Guofeng Hu, Chee Keong Tan\",\"doi\":\"10.1063/5.0245828\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Density functional theory was utilized to assess the influence of In alloying on the spontaneous (Psp) and piezoelectric (Ppe) polarization of ε-Ga2O3 heterostructures with In concentrations ranging from 0% to 50%. The analysis demonstrated a decrease in both Psp and Ppe with an increase in In concentration, described by the equations Psp = −9.5947x + 24.81 and Ppe = −0.6217x (where x represents the In concentration, with units in μC/cm2). Additionally, the polarization-induced two-dimensional electron gas (2DEG) density within ε-InGaO/ε-Ga2O3 heterostructures was examined using a one-dimensional Schrödinger–Poisson solver. An inverse correlation was observed between 2DEG density and epitaxial thickness across all undoped In-alloyed samples. Furthermore, achieving high 2DEG densities (exceeding 1013 cm−2) is significantly facilitated by n-type doping concentrations above 1017 cm−3 in ε-InGaO. These insights not only augment the understanding of polarization effects in ε-Ga2O3 heterostructures but also provide a strategic framework for enhancing 2DEG density in ε-Ga2O3-based devices, which offers significant potential for advancing ε-Ga2O3-based high electron mobility transistors for power and RF applications.\",\"PeriodicalId\":8094,\"journal\":{\"name\":\"Applied Physics Letters\",\"volume\":\"2 1\",\"pages\":\"\"},\"PeriodicalIF\":3.5000,\"publicationDate\":\"2025-01-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Physics Letters\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1063/5.0245828\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"PHYSICS, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics Letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1063/5.0245828","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
Indium alloying in ε -Ga2O3 for polarization and interfacial charge tuning
Density functional theory was utilized to assess the influence of In alloying on the spontaneous (Psp) and piezoelectric (Ppe) polarization of ε-Ga2O3 heterostructures with In concentrations ranging from 0% to 50%. The analysis demonstrated a decrease in both Psp and Ppe with an increase in In concentration, described by the equations Psp = −9.5947x + 24.81 and Ppe = −0.6217x (where x represents the In concentration, with units in μC/cm2). Additionally, the polarization-induced two-dimensional electron gas (2DEG) density within ε-InGaO/ε-Ga2O3 heterostructures was examined using a one-dimensional Schrödinger–Poisson solver. An inverse correlation was observed between 2DEG density and epitaxial thickness across all undoped In-alloyed samples. Furthermore, achieving high 2DEG densities (exceeding 1013 cm−2) is significantly facilitated by n-type doping concentrations above 1017 cm−3 in ε-InGaO. These insights not only augment the understanding of polarization effects in ε-Ga2O3 heterostructures but also provide a strategic framework for enhancing 2DEG density in ε-Ga2O3-based devices, which offers significant potential for advancing ε-Ga2O3-based high electron mobility transistors for power and RF applications.
期刊介绍:
Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology.
In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics.
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Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.