壳聚糖/羟基磷灰石膜在直流放电中的等离子体修饰:表面特性及其与成纤维细胞的相互作用

IF 2.5 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Almaz Kamalov, Ekaterina Endiiarova, Aleksey Ivanov, Liubov Danilishina, Natalia Saprykina, Natalia Smirnova, Konstantin Kolbe, Artem Osipov, Vladimir Yudin
{"title":"壳聚糖/羟基磷灰石膜在直流放电中的等离子体修饰:表面特性及其与成纤维细胞的相互作用","authors":"Almaz Kamalov,&nbsp;Ekaterina Endiiarova,&nbsp;Aleksey Ivanov,&nbsp;Liubov Danilishina,&nbsp;Natalia Saprykina,&nbsp;Natalia Smirnova,&nbsp;Konstantin Kolbe,&nbsp;Artem Osipov,&nbsp;Vladimir Yudin","doi":"10.1007/s00339-025-08244-0","DOIUrl":null,"url":null,"abstract":"<div><p>The development of technology for modifying polymer materials using cold plasma is an urgent task, as traditional chemical etching leaves a toxic trace that can harm cell viability. The purpose of this work is to modify the surface of composite films composed of chitosan and hydroxyapatite, using direct current (DC) plasma, to enhance the proliferation activity of human fibroblasts on these materials. The film modifications were evaluated using scanning electron microscopy (SEM), contact angle wetting (WCA), infrared spectroscopy (IR) and mass loss analysis. Biocompatibility of the composite films was assessed by the MTT method. Plasma treatment of films in air and argon for 1 min increases the free surface energy. After plasma treatment, the main characteristic oscillation bands change, which indicates the simultaneous destruction of the chitosan polymer chain with the rupture of the O-glycoside bond and the formation of new C-OH bonds. Approximately 1.5-2% of the mass of the initial film is etched in 1 min, after 1 min the etching rate slows down and reaches 3-3.5% for air and 1.8–2.1% for argon during 4-minute processing. The results of the SEM show that after treatment in air and argon plasma, the morphology of the studied films changes and resembles cells. DC plasma modification of the CS + HA composite film increased the proliferation activity fibroblast by 23% within 2 min in air and by 4 min in argon atmosphere.</p></div>","PeriodicalId":473,"journal":{"name":"Applied Physics A","volume":"131 2","pages":""},"PeriodicalIF":2.5000,"publicationDate":"2025-01-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Plasma modification of chitosan/hydroxyapatite films in a DC discharge: surface properties and interaction with fibroblasts\",\"authors\":\"Almaz Kamalov,&nbsp;Ekaterina Endiiarova,&nbsp;Aleksey Ivanov,&nbsp;Liubov Danilishina,&nbsp;Natalia Saprykina,&nbsp;Natalia Smirnova,&nbsp;Konstantin Kolbe,&nbsp;Artem Osipov,&nbsp;Vladimir Yudin\",\"doi\":\"10.1007/s00339-025-08244-0\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The development of technology for modifying polymer materials using cold plasma is an urgent task, as traditional chemical etching leaves a toxic trace that can harm cell viability. The purpose of this work is to modify the surface of composite films composed of chitosan and hydroxyapatite, using direct current (DC) plasma, to enhance the proliferation activity of human fibroblasts on these materials. The film modifications were evaluated using scanning electron microscopy (SEM), contact angle wetting (WCA), infrared spectroscopy (IR) and mass loss analysis. Biocompatibility of the composite films was assessed by the MTT method. Plasma treatment of films in air and argon for 1 min increases the free surface energy. After plasma treatment, the main characteristic oscillation bands change, which indicates the simultaneous destruction of the chitosan polymer chain with the rupture of the O-glycoside bond and the formation of new C-OH bonds. Approximately 1.5-2% of the mass of the initial film is etched in 1 min, after 1 min the etching rate slows down and reaches 3-3.5% for air and 1.8–2.1% for argon during 4-minute processing. The results of the SEM show that after treatment in air and argon plasma, the morphology of the studied films changes and resembles cells. DC plasma modification of the CS + HA composite film increased the proliferation activity fibroblast by 23% within 2 min in air and by 4 min in argon atmosphere.</p></div>\",\"PeriodicalId\":473,\"journal\":{\"name\":\"Applied Physics A\",\"volume\":\"131 2\",\"pages\":\"\"},\"PeriodicalIF\":2.5000,\"publicationDate\":\"2025-01-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Applied Physics A\",\"FirstCategoryId\":\"4\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s00339-025-08244-0\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Applied Physics A","FirstCategoryId":"4","ListUrlMain":"https://link.springer.com/article/10.1007/s00339-025-08244-0","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

利用冷等离子体修饰聚合物材料的技术的发展是一项紧迫的任务,因为传统的化学蚀刻会留下有毒的痕迹,可能会损害细胞的活力。本研究的目的是利用直流等离子体对壳聚糖和羟基磷灰石复合膜表面进行修饰,以增强成纤维细胞在其表面的增殖活性。通过扫描电镜(SEM)、接触角润湿(WCA)、红外光谱(IR)和质量损失分析对膜改性进行了评价。采用MTT法评价复合膜的生物相容性。薄膜在空气和氩气中等离子体处理1分钟可增加自由表面能。等离子体处理后,主要特征振荡带发生变化,表明壳聚糖聚合物链同时破坏,o -糖苷键断裂,形成新的C-OH键。大约1.5-2%的初始膜质量在1分钟内蚀刻,1分钟后蚀刻速率减慢,在4分钟的加工过程中,空气的蚀刻速率达到3-3.5%,氩气的蚀刻速率达到1.8-2.1%。扫描电镜结果表明,在空气和氩气等离子体中处理后,所研究的薄膜的形貌发生了变化,与细胞相似。DC等离子体修饰CS + HA复合膜后,成纤维细胞在空气中2 min和氩气中4 min的增殖活性分别提高23%和23%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Plasma modification of chitosan/hydroxyapatite films in a DC discharge: surface properties and interaction with fibroblasts

The development of technology for modifying polymer materials using cold plasma is an urgent task, as traditional chemical etching leaves a toxic trace that can harm cell viability. The purpose of this work is to modify the surface of composite films composed of chitosan and hydroxyapatite, using direct current (DC) plasma, to enhance the proliferation activity of human fibroblasts on these materials. The film modifications were evaluated using scanning electron microscopy (SEM), contact angle wetting (WCA), infrared spectroscopy (IR) and mass loss analysis. Biocompatibility of the composite films was assessed by the MTT method. Plasma treatment of films in air and argon for 1 min increases the free surface energy. After plasma treatment, the main characteristic oscillation bands change, which indicates the simultaneous destruction of the chitosan polymer chain with the rupture of the O-glycoside bond and the formation of new C-OH bonds. Approximately 1.5-2% of the mass of the initial film is etched in 1 min, after 1 min the etching rate slows down and reaches 3-3.5% for air and 1.8–2.1% for argon during 4-minute processing. The results of the SEM show that after treatment in air and argon plasma, the morphology of the studied films changes and resembles cells. DC plasma modification of the CS + HA composite film increased the proliferation activity fibroblast by 23% within 2 min in air and by 4 min in argon atmosphere.

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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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