后退火rGO-SnS2包埋PMMA聚合物纳米复合膜非易失性电阻记忆性能的改善

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Nipom Sekhar Das, Nipu Kumar Das
{"title":"后退火rGO-SnS2包埋PMMA聚合物纳米复合膜非易失性电阻记忆性能的改善","authors":"Nipom Sekhar Das,&nbsp;Nipu Kumar Das","doi":"10.1007/s10854-024-14191-y","DOIUrl":null,"url":null,"abstract":"<div><p>Two-dimensional (2D) materials used to form nanohybrids have emerged as promising components for controlling carrier confinement and transportation in resistive memory devices. To investigate the memristive properties in a metal–insulator–metal (MIM) configuration, nanohybrid of reduced graphene oxide-tin disulfide (rGO-SnS<sub>2</sub>) was synthesized and incorporated with poly (methyl methacrylate) (PMMA) matrix to prepare the polymer nanocomposites (PNCs). The crystallinity and uniformity of the spin-coated PNCs film over the ITO substrate are enhanced through annealing at 200 °C for 4 h in order to improve the resistive switching properties in memory devices. Furthermore, the optical, structural, and morphological characteristics of the films are done using various spectroscopic and microscopic techniques, namely, UV–Visible DRS, Raman, X-ray diffraction (XRD), Atomic force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Thermogravimetric analysis (TGA) is performed to ensure the stability and structural integrity of the material. XRD analysis shows the drastic reduction in the peak intensity of the film annealed at 250 °C suggesting the deterioration of the film’s crystallinity. In contrast, the film annealed at 200 °C shows better crystallinity than the as-deposited film resulting in enhanced memory behaviour. The post-annealed thin film (200 °C)-based devices exhibit write-once-read-many (WORM) memory characteristics with lower switching voltage (&lt; 2 V) and enhanced switching ratio (<span>\\(\\frac{{I}_{ON}}{ {I}_{OFF}}\\)</span>) ~ 10<sup>4</sup>. For resistive switching technology, rGO-SnS₂ delivers beneficial outcomes like improved trapping mechanisms and enhanced charge transport channels. The interface at the rGO and SnS<sub>2</sub> in the nanohybrid plays a pivotal role in the separation of charge carriers and charge conduction process in the device. A theoretical concept is elucidated to clarify the charge transport mechanism through the devices that follows space charge limited current (SCLC) conduction and Ohm’s law in the high resistance state (HRS) and low resistance state (LRS), respectively. Moreover, the charge transport phenomenon in the device is explained using a plausible energy band diagram.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"36 2","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2025-01-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Improvement of non-volatile resistive memory behaviour in post-annealed rGO-SnS2 embedded PMMA polymer nanocomposites film\",\"authors\":\"Nipom Sekhar Das,&nbsp;Nipu Kumar Das\",\"doi\":\"10.1007/s10854-024-14191-y\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Two-dimensional (2D) materials used to form nanohybrids have emerged as promising components for controlling carrier confinement and transportation in resistive memory devices. To investigate the memristive properties in a metal–insulator–metal (MIM) configuration, nanohybrid of reduced graphene oxide-tin disulfide (rGO-SnS<sub>2</sub>) was synthesized and incorporated with poly (methyl methacrylate) (PMMA) matrix to prepare the polymer nanocomposites (PNCs). The crystallinity and uniformity of the spin-coated PNCs film over the ITO substrate are enhanced through annealing at 200 °C for 4 h in order to improve the resistive switching properties in memory devices. Furthermore, the optical, structural, and morphological characteristics of the films are done using various spectroscopic and microscopic techniques, namely, UV–Visible DRS, Raman, X-ray diffraction (XRD), Atomic force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Thermogravimetric analysis (TGA) is performed to ensure the stability and structural integrity of the material. XRD analysis shows the drastic reduction in the peak intensity of the film annealed at 250 °C suggesting the deterioration of the film’s crystallinity. In contrast, the film annealed at 200 °C shows better crystallinity than the as-deposited film resulting in enhanced memory behaviour. The post-annealed thin film (200 °C)-based devices exhibit write-once-read-many (WORM) memory characteristics with lower switching voltage (&lt; 2 V) and enhanced switching ratio (<span>\\\\(\\\\frac{{I}_{ON}}{ {I}_{OFF}}\\\\)</span>) ~ 10<sup>4</sup>. For resistive switching technology, rGO-SnS₂ delivers beneficial outcomes like improved trapping mechanisms and enhanced charge transport channels. The interface at the rGO and SnS<sub>2</sub> in the nanohybrid plays a pivotal role in the separation of charge carriers and charge conduction process in the device. A theoretical concept is elucidated to clarify the charge transport mechanism through the devices that follows space charge limited current (SCLC) conduction and Ohm’s law in the high resistance state (HRS) and low resistance state (LRS), respectively. Moreover, the charge transport phenomenon in the device is explained using a plausible energy band diagram.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"36 2\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2025-01-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-024-14191-y\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-024-14191-y","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

用于形成纳米杂化的二维(2D)材料已成为控制电阻存储器件中载流子约束和运输的有前途的组件。为了研究金属-绝缘体-金属(MIM)结构的忆阻性能,合成了还原氧化石墨烯-二硫化锡(rGO-SnS2)的纳米杂化材料,并与聚甲基丙烯酸甲酯(PMMA)基体结合制备了聚合物纳米复合材料(PNCs)。通过在200°C下退火4小时,提高了ITO衬底上自旋涂覆pnc薄膜的结晶度和均匀性,以改善存储器件的电阻开关性能。此外,利用各种光谱和显微技术,即紫外-可见DRS,拉曼,x射线衍射(XRD),原子力显微镜(AFM),扫描电子显微镜(SEM)和透射电子显微镜(TEM),完成了薄膜的光学,结构和形态特征。进行热重分析(TGA)以确保材料的稳定性和结构完整性。XRD分析表明,在250℃退火后,薄膜的峰值强度急剧下降,表明薄膜的结晶度下降。相比之下,在200°C退火后的薄膜结晶度比沉积时的薄膜更好,从而增强了记忆行为。后退火薄膜(200°C)器件具有低开关电压(&lt; 2v)和高开关比(\(\frac{{I}_{ON}}{ {I}_{OFF}}\)) 104的写一次读多(WORM)存储特性。对于电阻开关技术,rGO-SnS 2提供了有益的结果,如改进的捕获机制和增强的电荷传输通道。纳米杂化材料中rGO和SnS2的界面对器件中载流子的分离和电荷传导过程起着关键作用。阐明了器件在高阻态(HRS)和低阻态(LRS)下分别遵循空间电荷限流(SCLC)传导和欧姆定律的电荷输运机理的理论概念。此外,用一个合理的能带图解释了器件中的电荷输运现象。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Improvement of non-volatile resistive memory behaviour in post-annealed rGO-SnS2 embedded PMMA polymer nanocomposites film

Two-dimensional (2D) materials used to form nanohybrids have emerged as promising components for controlling carrier confinement and transportation in resistive memory devices. To investigate the memristive properties in a metal–insulator–metal (MIM) configuration, nanohybrid of reduced graphene oxide-tin disulfide (rGO-SnS2) was synthesized and incorporated with poly (methyl methacrylate) (PMMA) matrix to prepare the polymer nanocomposites (PNCs). The crystallinity and uniformity of the spin-coated PNCs film over the ITO substrate are enhanced through annealing at 200 °C for 4 h in order to improve the resistive switching properties in memory devices. Furthermore, the optical, structural, and morphological characteristics of the films are done using various spectroscopic and microscopic techniques, namely, UV–Visible DRS, Raman, X-ray diffraction (XRD), Atomic force microscopy (AFM), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). Thermogravimetric analysis (TGA) is performed to ensure the stability and structural integrity of the material. XRD analysis shows the drastic reduction in the peak intensity of the film annealed at 250 °C suggesting the deterioration of the film’s crystallinity. In contrast, the film annealed at 200 °C shows better crystallinity than the as-deposited film resulting in enhanced memory behaviour. The post-annealed thin film (200 °C)-based devices exhibit write-once-read-many (WORM) memory characteristics with lower switching voltage (< 2 V) and enhanced switching ratio (\(\frac{{I}_{ON}}{ {I}_{OFF}}\)) ~ 104. For resistive switching technology, rGO-SnS₂ delivers beneficial outcomes like improved trapping mechanisms and enhanced charge transport channels. The interface at the rGO and SnS2 in the nanohybrid plays a pivotal role in the separation of charge carriers and charge conduction process in the device. A theoretical concept is elucidated to clarify the charge transport mechanism through the devices that follows space charge limited current (SCLC) conduction and Ohm’s law in the high resistance state (HRS) and low resistance state (LRS), respectively. Moreover, the charge transport phenomenon in the device is explained using a plausible energy band diagram.

求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信