用于片上储能的微电池光刻微细加工

IF 26.6 1区 材料科学 Q1 Engineering
Yuan Ma, Sen Wang, Zhong-Shuai Wu
{"title":"用于片上储能的微电池光刻微细加工","authors":"Yuan Ma,&nbsp;Sen Wang,&nbsp;Zhong-Shuai Wu","doi":"10.1007/s40820-024-01625-9","DOIUrl":null,"url":null,"abstract":"<div><p>Microbatteries (MBs) are crucial to power miniaturized devices for the Internet of Things. In the evolutionary journey of MBs, fabrication technology emerges as the cornerstone, guiding the intricacies of their configuration designs, ensuring precision, and facilitating scalability for mass production. Photolithography stands out as an ideal technology, leveraging its unparalleled resolution, exceptional design flexibility, and entrenched position within the mature semiconductor industry. However, comprehensive reviews on its application in MB development remain scarce. This review aims to bridge that gap by thoroughly assessing the recent status and promising prospects of photolithographic microfabrication for MBs. Firstly, we delve into the fundamental principles and step-by-step procedures of photolithography, offering a nuanced understanding of its operational mechanisms and the criteria for photoresist selection. Subsequently, we highlighted the specific roles of photolithography in the fabrication of MBs, including its utilization as a template for creating miniaturized micropatterns, a protective layer during the etching process, a mold for soft lithography, a constituent of MB active component, and a sacrificial layer in the construction of micro-Swiss-roll structure. Finally, the review concludes with a summary of the key challenges and future perspectives of MBs fabricated by photolithography, providing comprehensive insights and sparking research inspiration in this field.</p><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>","PeriodicalId":714,"journal":{"name":"Nano-Micro Letters","volume":"17 1","pages":""},"PeriodicalIF":26.6000,"publicationDate":"2025-01-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s40820-024-01625-9.pdf","citationCount":"0","resultStr":"{\"title\":\"Photolithographic Microfabrication of Microbatteries for On-Chip Energy Storage\",\"authors\":\"Yuan Ma,&nbsp;Sen Wang,&nbsp;Zhong-Shuai Wu\",\"doi\":\"10.1007/s40820-024-01625-9\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Microbatteries (MBs) are crucial to power miniaturized devices for the Internet of Things. In the evolutionary journey of MBs, fabrication technology emerges as the cornerstone, guiding the intricacies of their configuration designs, ensuring precision, and facilitating scalability for mass production. Photolithography stands out as an ideal technology, leveraging its unparalleled resolution, exceptional design flexibility, and entrenched position within the mature semiconductor industry. However, comprehensive reviews on its application in MB development remain scarce. This review aims to bridge that gap by thoroughly assessing the recent status and promising prospects of photolithographic microfabrication for MBs. Firstly, we delve into the fundamental principles and step-by-step procedures of photolithography, offering a nuanced understanding of its operational mechanisms and the criteria for photoresist selection. Subsequently, we highlighted the specific roles of photolithography in the fabrication of MBs, including its utilization as a template for creating miniaturized micropatterns, a protective layer during the etching process, a mold for soft lithography, a constituent of MB active component, and a sacrificial layer in the construction of micro-Swiss-roll structure. Finally, the review concludes with a summary of the key challenges and future perspectives of MBs fabricated by photolithography, providing comprehensive insights and sparking research inspiration in this field.</p><div><figure><div><div><picture><source><img></source></picture></div></div></figure></div></div>\",\"PeriodicalId\":714,\"journal\":{\"name\":\"Nano-Micro Letters\",\"volume\":\"17 1\",\"pages\":\"\"},\"PeriodicalIF\":26.6000,\"publicationDate\":\"2025-01-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://link.springer.com/content/pdf/10.1007/s40820-024-01625-9.pdf\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Nano-Micro Letters\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s40820-024-01625-9\",\"RegionNum\":1,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"Engineering\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nano-Micro Letters","FirstCategoryId":"88","ListUrlMain":"https://link.springer.com/article/10.1007/s40820-024-01625-9","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"Engineering","Score":null,"Total":0}
引用次数: 0

摘要

微电池(mb)对于为物联网小型化设备供电至关重要。在mb的发展历程中,制造技术作为基石出现,指导其配置设计的复杂性,确保精度,并促进大规模生产的可扩展性。光刻技术作为一种理想的技术脱颖而出,利用其无与伦比的分辨率,卓越的设计灵活性,以及在成熟的半导体行业中根深蒂固的地位。然而,关于其在MB开发中的应用的综合综述仍然很少。本文旨在通过全面评估MBs光刻微细加工的最新现状和前景来弥合这一差距。首先,我们深入研究了光刻的基本原理和一步一步的过程,提供了其操作机制和光刻胶选择标准的细致理解。随后,我们强调了光刻技术在MB制造中的具体作用,包括其作为创建小型化微图案的模板,蚀刻过程中的保护层,软光刻的模具,MB活性成分的组成以及微瑞士卷结构构建中的牺牲层。最后,总结了光刻制备MBs的主要挑战和未来前景,为该领域的研究提供了全面的见解和启发。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photolithographic Microfabrication of Microbatteries for On-Chip Energy Storage

Microbatteries (MBs) are crucial to power miniaturized devices for the Internet of Things. In the evolutionary journey of MBs, fabrication technology emerges as the cornerstone, guiding the intricacies of their configuration designs, ensuring precision, and facilitating scalability for mass production. Photolithography stands out as an ideal technology, leveraging its unparalleled resolution, exceptional design flexibility, and entrenched position within the mature semiconductor industry. However, comprehensive reviews on its application in MB development remain scarce. This review aims to bridge that gap by thoroughly assessing the recent status and promising prospects of photolithographic microfabrication for MBs. Firstly, we delve into the fundamental principles and step-by-step procedures of photolithography, offering a nuanced understanding of its operational mechanisms and the criteria for photoresist selection. Subsequently, we highlighted the specific roles of photolithography in the fabrication of MBs, including its utilization as a template for creating miniaturized micropatterns, a protective layer during the etching process, a mold for soft lithography, a constituent of MB active component, and a sacrificial layer in the construction of micro-Swiss-roll structure. Finally, the review concludes with a summary of the key challenges and future perspectives of MBs fabricated by photolithography, providing comprehensive insights and sparking research inspiration in this field.

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来源期刊
Nano-Micro Letters
Nano-Micro Letters NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
32.60
自引率
4.90%
发文量
981
审稿时长
1.1 months
期刊介绍: Nano-Micro Letters is a peer-reviewed, international, interdisciplinary, and open-access journal published under the SpringerOpen brand. Nano-Micro Letters focuses on the science, experiments, engineering, technologies, and applications of nano- or microscale structures and systems in various fields such as physics, chemistry, biology, material science, and pharmacy.It also explores the expanding interfaces between these fields. Nano-Micro Letters particularly emphasizes the bottom-up approach in the length scale from nano to micro. This approach is crucial for achieving industrial applications in nanotechnology, as it involves the assembly, modification, and control of nanostructures on a microscale.
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