通过小分子反溶剂策略抑制暗电流密度的高性能 Perovskite 光电探测器

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Zhewen Xie, Yong Zhu, Xiong Chang, Mengni Zhou, Dongfang Li, Hua Wang, Xing Zhu, Tao Zhu
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引用次数: 0

摘要

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High-Performance Perovskite Photodetectors with Suppressed Dark Current Density via Small Molecule in Antisolvent Strategy

High-Performance Perovskite Photodetectors with Suppressed Dark Current Density via Small Molecule in Antisolvent Strategy
Dark current density, a critical parameter in perovskite photodetectors (PPDs), largely depends on the quality of the perovskite film. Herein, we introduce a new small molecule in antisolvent strategy to enhance perovskite film quality during the crystallization of Cs0.05(FA0.95MA0.05)0.95Pb(I0.95Br0.05)3. COTIC-4Cl, an N-type narrow bandgap nonfullerene small molecule with specific functional group, could strongly bind to the uncoordinated Pb2+ in the perovskite with assistance of antisolvent, enabling rapid supersaturation of perovskite solution and form dense structures under low-temperature annealing. This strategy leads to the decreased nonradiative recombination and improved carrier transport efficiency in COTIC-4Cl-modified perovskites. The PPDs based on COTIC-4Cl-modified films exhibit a broad spectral response from 300 to 815 nm, an exceptionally low dark current density of 2.17 × 10–11 A cm–2, and enhanced detectivities of 1.84 × 1014and 3.09 × 1012 Jones at 0 and −0.5 V bias, respectively. Improved responsivity and detectivity at 650–780 nm result from strong near-infrared light absorption by COTIC-4Cl. These optimized PPDs are comparable to commercial silicon photodetectors, promising significant advancements in cost-effective photodetector technology.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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