激光刺激下电子从带负电荷的介电基片上的光分离

IF 3.6 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Y. Ussenov, M. N. Shneider, S. Yatom, Y. Raitses
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引用次数: 0

摘要

对于各种类型的材料,体电子的光子激发发射已经得到了广泛的研究,而剩余表面电子的光剥离尚未得到充分的探讨。光剥离势垒能通常由材料的表面电子亲和力来定义,它通常小于功函数,并且对于非导电衬底和具有连续电子流到表面的环境(例如气体放电等离子体)更为明显。本文通过实验证明,介质材料非导电表面等离子体诱导充电产生的剩余电子的光剥离产率取决于初始表面电荷密度,而与气体放电充电条件下这些材料的表示亲和值无关。这一结果是利用激光刺激的熔融二氧化硅、氮化硼和氧化铝的光分离得到的,对于理解充放电动力学、二次电子发射、影响等离子体壁相互作用的光发射效应(与表面和电容耦合放电、尘埃等离子体、静电探针诊断以及材料的等离子体处理、等离子体推进和气体击穿相关)至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Laser-stimulated photodetachment of electrons from the negatively charged dielectric substrates
The photon-stimulated emission of bulk electrons has been extensively studied for various types of materials, while the photodetachment of surplus surface electrons has not been fully explored. The photodetachment barrier energy is commonly defined by the surface electron affinity of material, which is typically less than the work function and more pronounced for non-conducting substrates and in environments with a continuous flux of electrons to the surface, such as in gas discharge plasmas. Herein, it is experimentally shown that the photodetachment yield of surplus electrons created by plasma-induced charging of non-conductive surfaces of dielectric materials depends on the initial surface charge density and do not correlate with the tabulated affinity values of these materials under gas discharge charging conditions. This result obtained using laser-stimulated photodetachment for fused silica, boron nitride, and alumina, is critically important for the understanding of charging and discharging dynamics, secondary electron emission, and photo emission effects affecting plasma–wall interactions relevant to surface and capacitively coupled discharges, dusty plasmas, electrostatic probe diagnostics, and applications for plasma processing of materials, plasma propulsion, and gas breakdown.
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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