热诱导增强射频溅射CdS薄膜光电探测器的光响应

IF 3.4 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Athulkrishna Manilal, Shantikumar Nair, Laxman Raju Thoutam
{"title":"热诱导增强射频溅射CdS薄膜光电探测器的光响应","authors":"Athulkrishna Manilal,&nbsp;Shantikumar Nair,&nbsp;Laxman Raju Thoutam","doi":"10.1002/adem.202401942","DOIUrl":null,"url":null,"abstract":"<p>This work focuses on understanding the defect-related electronic transport in cadmium sulfide (CdS) thin films, and finds thermal treatment as an efficient tool to tailor its intrinsic defect charge carrier concentration for optimum visible-light photodetection performance. The radio frequency (RF)-sputtered CdS thin-films show a substantial decrease in measured dark-current by three orders of magnitude (μA to nA) with an increase in substrate deposition temperature (<i>T</i><sub><i>s</i></sub>) from room-temperature (<i>RT</i>) to a maximum of 400 °C. With increase in <i>T</i><sub><i>s</i></sub>, the current conduction behavior changes from Ohmic (at <i>RT</i>) to Schottky-behavior (<i>T</i><sub><i>s</i></sub> ≥ 100–400 °C). The decrease in dark-current and the crossover from Ohmic to Schottky electronic transport behavior, pointed to a decrease in defect-density charge carrier concentration, with increased <i>T</i><sub><i>s</i></sub>. Additionally, post-deposition thermal annealing of CdS thin films also is found to result in a similar decrease in dark-current (μA to nA). The photo-to-dark-current ratio of CdS thin-film visible-light photodetectors increased by two-orders of magnitude, and its dynamic response time decreased by an order of magnitude via. thermal engineering. The thermal-annealing treatment possibly reduced the defect-related trap-sites, which enables a reliable and faster photo-switching response for CdS thin-film-based visible-light photodetectors.</p>","PeriodicalId":7275,"journal":{"name":"Advanced Engineering Materials","volume":"26 24","pages":""},"PeriodicalIF":3.4000,"publicationDate":"2024-11-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Thermally Induced Enhancement of Photoresponse in Radio Frequency-Sputtered CdS Thin-Film Photodetectors\",\"authors\":\"Athulkrishna Manilal,&nbsp;Shantikumar Nair,&nbsp;Laxman Raju Thoutam\",\"doi\":\"10.1002/adem.202401942\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>This work focuses on understanding the defect-related electronic transport in cadmium sulfide (CdS) thin films, and finds thermal treatment as an efficient tool to tailor its intrinsic defect charge carrier concentration for optimum visible-light photodetection performance. The radio frequency (RF)-sputtered CdS thin-films show a substantial decrease in measured dark-current by three orders of magnitude (μA to nA) with an increase in substrate deposition temperature (<i>T</i><sub><i>s</i></sub>) from room-temperature (<i>RT</i>) to a maximum of 400 °C. With increase in <i>T</i><sub><i>s</i></sub>, the current conduction behavior changes from Ohmic (at <i>RT</i>) to Schottky-behavior (<i>T</i><sub><i>s</i></sub> ≥ 100–400 °C). The decrease in dark-current and the crossover from Ohmic to Schottky electronic transport behavior, pointed to a decrease in defect-density charge carrier concentration, with increased <i>T</i><sub><i>s</i></sub>. Additionally, post-deposition thermal annealing of CdS thin films also is found to result in a similar decrease in dark-current (μA to nA). The photo-to-dark-current ratio of CdS thin-film visible-light photodetectors increased by two-orders of magnitude, and its dynamic response time decreased by an order of magnitude via. thermal engineering. The thermal-annealing treatment possibly reduced the defect-related trap-sites, which enables a reliable and faster photo-switching response for CdS thin-film-based visible-light photodetectors.</p>\",\"PeriodicalId\":7275,\"journal\":{\"name\":\"Advanced Engineering Materials\",\"volume\":\"26 24\",\"pages\":\"\"},\"PeriodicalIF\":3.4000,\"publicationDate\":\"2024-11-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Advanced Engineering Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://onlinelibrary.wiley.com/doi/10.1002/adem.202401942\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Engineering Materials","FirstCategoryId":"88","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/adem.202401942","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

摘要

本研究的重点是了解硫化镉(cd)薄膜中与缺陷相关的电子输运,并发现热处理是一种有效的工具,可以调整其固有缺陷电荷载流子浓度,以获得最佳的可见光光电探测性能。随着衬底沉积温度(Ts)从室温(RT)升高到最高400℃,射频溅射CdS薄膜的暗电流测量值(μA ~ nA)显著降低了3个数量级。随着Ts的增加,电流传导行为从欧姆(RT)转变为肖特基行为(Ts≥100-400℃)。暗电流的减小和从欧姆到肖特基电子输运行为的交叉表明,缺陷密度载流子浓度随着Ts的增加而降低。此外,沉积后CdS薄膜的热退火也发现了类似的暗电流(μA到nA)的降低。CdS薄膜可见光探测器的光暗电流比提高了两个数量级,动态响应时间降低了一个数量级。热工程。热退火处理可能会减少缺陷相关的陷阱位点,从而为基于CdS薄膜的可见光光电探测器提供可靠和更快的光开关响应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Thermally Induced Enhancement of Photoresponse in Radio Frequency-Sputtered CdS Thin-Film Photodetectors

Thermally Induced Enhancement of Photoresponse in Radio Frequency-Sputtered CdS Thin-Film Photodetectors

This work focuses on understanding the defect-related electronic transport in cadmium sulfide (CdS) thin films, and finds thermal treatment as an efficient tool to tailor its intrinsic defect charge carrier concentration for optimum visible-light photodetection performance. The radio frequency (RF)-sputtered CdS thin-films show a substantial decrease in measured dark-current by three orders of magnitude (μA to nA) with an increase in substrate deposition temperature (Ts) from room-temperature (RT) to a maximum of 400 °C. With increase in Ts, the current conduction behavior changes from Ohmic (at RT) to Schottky-behavior (Ts ≥ 100–400 °C). The decrease in dark-current and the crossover from Ohmic to Schottky electronic transport behavior, pointed to a decrease in defect-density charge carrier concentration, with increased Ts. Additionally, post-deposition thermal annealing of CdS thin films also is found to result in a similar decrease in dark-current (μA to nA). The photo-to-dark-current ratio of CdS thin-film visible-light photodetectors increased by two-orders of magnitude, and its dynamic response time decreased by an order of magnitude via. thermal engineering. The thermal-annealing treatment possibly reduced the defect-related trap-sites, which enables a reliable and faster photo-switching response for CdS thin-film-based visible-light photodetectors.

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来源期刊
Advanced Engineering Materials
Advanced Engineering Materials 工程技术-材料科学:综合
CiteScore
5.70
自引率
5.60%
发文量
544
审稿时长
1.7 months
期刊介绍: Advanced Engineering Materials is the membership journal of three leading European Materials Societies - German Materials Society/DGM, - French Materials Society/SF2M, - Swiss Materials Federation/SVMT.
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