提高用低能量大电流电子束预处理的次共晶铝硅合金上生长的阳极氧化物的显微硬度和耐腐蚀性能

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
A. Lucchini Huspek, B. Akdogan, Yu. H. Akhmadeev, E. A. Petrikova, Yu. F. Ivanov, P. V. Moskvin, N. N. Koval, M. Bestetti
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引用次数: 0

摘要

工业中广泛采用阳极氧化法来赋予铝硅合金较高的机械性能并提高其耐腐蚀性。然而,与纯铝相比,高含量的硅阻碍了均匀阳极氧化层的生长,导致氧化物内部裂纹和孔隙的形成。在本研究中,低能量大电流电子束被用作次共晶铝硅合金的预处理,以提高阳极氧化物的性能。经过电子束修饰的样品显示,硅在α基质中的分散细腻均匀,同时处理层中的硅含量也有所降低。在电子束预处理合金上生长的硬质阳极氧化物的显微硬度提高了 65%,腐蚀电流密度降低了 94%。截面 SEM 形貌和 EDX 元素图显示,阳极氧化物的缺陷较少,这与在铸态次共晶铝硅合金上形成的氧化物形成了鲜明对比。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Enhancing Microhardness and Corrosion Resistance of Anodic Oxides Grown on Hypoeutectic Al–Si Alloys Pretreated by Low-Energy High-Current Electron Beams

Enhancing Microhardness and Corrosion Resistance of Anodic Oxides Grown on Hypoeutectic Al–Si Alloys Pretreated by Low-Energy High-Current Electron Beams

Anodic oxidation is widely employed in industry to impart high mechanical properties and improve the corrosion resistance of Al–Si alloys. However, compared to pure Al, the high content of Si prevents the growth of a uniform anodic layer, leading to the formation of cracks and porosities within the oxide. In the present work, low-energy high-current electron beam is used as pretreatment of a hypoeutectic Al–Si alloy to enhance the properties of the anodic oxide. Electron beam modified samples showed a fine and homogenous dispersion of Si in the α-matrix, together with a content reduction of Si in the treated layer. Hard anodic oxides grown on electron beam pre-treated alloys exhibited a higher microhardness, increased by 65%, and a lower corrosion current density, decreased by 94%. Cross-sectional SEM morphology and EDX elemental maps showed less defective anodic oxides, in contrast with oxide formed on as-cast hypoeutectic Al–Si alloys.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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