估算涂有导电薄膜的电介质的内部充电电位

IF 0.5 Q4 PHYSICS, CONDENSED MATTER

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques Pub Date : 2024-12-18 DOI:10.1134/S1027451024700812

N. G. Orlikovskaya, E. Yu. Zykova, A. A. Tatarintsev

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引用次数: 0

摘要

对镀有导电金属膜的石英玻璃的充电电位进行了估算。估算的依据是阴极发光信号强度与入射电子束能量之间的测量关系。计算结果表明，当照射镀有 14 nm 厚金膜的石英玻璃时，电子能量为 10 keV 时，充电电势可达 1.7 kV，15 keV 时为 2.7 kV。对接地薄膜表面下产生的电场进行的估算表明，电场强度不超过 4 × 107 V/cm。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Estimation of Internal Charging Potentials of Dielectrics Coated with a Conductive Film

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Estimation of Internal Charging Potentials of Dielectrics Coated with a Conductive Film

The charging potentials of quartz glass coated with a conductive metal film were estimated. Estimations were made based on the measured dependence of the intensity of the cathodoluminescent signal on the energy of the incident electron beam. Calculations showed that when quartz glass coated with a 14 nm thick Au film is irradiated, the charging potential can reach 1.7 kV at an electron energy of 10 keV and 2.7 kV at 15 keV. An estimation of the electric field generating under the surface of the grounded film demonstrated that the field strength does not exceed 4 × 10⁷ V/cm.

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来源期刊

Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques PHYSICS, CONDENSED MATTER-

CiteScore

0.90

自引率

25.00%

发文量

144

审稿时长

3-8 weeks

期刊介绍： Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.