非热大气压等离子体暴露对谷物种子表面改性的影响

IF 0.5 Q4 PHYSICS, CONDENSED MATTER
B. B. Baldanov, A. P. Semenov, Ts. V. Ranzhurov
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引用次数: 0

摘要

研究了非热等离子体对春小麦种子表面特性的影响。采用常压辉光放电的体积非热氩等离子体源对种子进行等离子体处理。放电是在具有多点分割阴极和扁平金属阳极的电极结构中产生的。制备了两批种子,每批100粒。一批种子暴露在等离子体中,另一批种子作为对照。通过电子扫描显微镜的润湿性测量和表面改性分析来评价等离子体对种子材料的影响。结果表明,等离子体处理使种子表面具有亲水性,其特征是接触角减小,表面能增大。结果表明,等离子体暴露在小麦种皮表面会导致种皮表面的改变,这种改变表现在种皮表面呈现出具有不同细胞大小和相当清晰边界的细网格形态;随着曝光时间的延长或放电功率的增大,对种子表面的腐蚀效应也随之增大。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Effect of Exposure to Nonthermal Atmospheric Pressure Plasma on Surface Modification of Cereal Seeds

Effect of Exposure to Nonthermal Atmospheric Pressure Plasma on Surface Modification of Cereal Seeds

The influence of nonthermal plasma on the surface properties of spring wheat seeds was studied. For plasma treatment of seeds a source of volumetric nonthermal argon plasma based on glow discharge at atmospheric pressure was used. The discharge was created in an electrode structure with a multipointed sectioned cathode and a flat metal anode. Two batches of seeds were prepared, each batch containing 100 seeds. Seeds from one batch were exposed to plasma, while seeds from the other batch were used as controls. Wettability measurements and surface modification analysis by electron scanning microscopy were performed to evaluate the plasma effects on the seed material. It was shown that as a result of plasma treatment the surface of seeds becomes hydrophilic, which is characterized by a decrease in the contact angle and an increase in the surface energy of seeds. It was established that plasma exposure of wheat seed coatings leads to modification of the seed surface, which consists in the manifestation of a fine mesh morphology on the seed surface with different cell size and rather sharply defined boundaries; the etching effects on the seed surface increase with increasing exposure duration or discharge power.

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来源期刊
CiteScore
0.90
自引率
25.00%
发文量
144
审稿时长
3-8 weeks
期刊介绍: Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
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