通过超薄氧化镍过渡层的电位调节实现增强光伏响应的透明 CuI/InGaZnO4 pn 结

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Dawei Liu, Rui Wang, Chengyu Jia, Dingwei Wang, Zhiguo Zhao, Jiaqi Pan, Lei Shi
{"title":"通过超薄氧化镍过渡层的电位调节实现增强光伏响应的透明 CuI/InGaZnO4 pn 结","authors":"Dawei Liu,&nbsp;Rui Wang,&nbsp;Chengyu Jia,&nbsp;Dingwei Wang,&nbsp;Zhiguo Zhao,&nbsp;Jiaqi Pan,&nbsp;Lei Shi","doi":"10.1007/s10854-024-14029-7","DOIUrl":null,"url":null,"abstract":"<div><p>The transparent device in ultrathin NiO layer modified CuI/InGaZnO<sub>4</sub> pn junction is prepared via sputtering-in situ iodization method. The CuI/NiO/InGaZnO<sub>4</sub> exhibits transmittance of ~ 85–90%, photovoltaic enhancement of ~ 1.3 × 10<sup>3</sup>-folds, stable output in 15 days. It can be mainly attributed to the ultrathin NiO layer. Besides appropriate Fermi level can alleviate potential gradient, the ultrathin NiO layer, with surface optimization and p-type carrier injection via Cu<sup>+</sup>/Cu<sup>2+</sup>, Ni<sup>2+</sup>/Ni<sup>3+</sup>-interstitial oxygen synergism, as well as high transparency by wide band gap, can improve the photo-generated carrier kinetic equilibrium for achieving PCE-transparency balance, while exhibiting good stability via the all inorganic structures, making them being competitive in transparent devices.</p></div>","PeriodicalId":646,"journal":{"name":"Journal of Materials Science: Materials in Electronics","volume":"35 36","pages":""},"PeriodicalIF":2.8000,"publicationDate":"2024-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"The transparent CuI/InGaZnO4 pn junction toward enhanced photovoltaic response via potential regulation of ultrathin NiO transition layer\",\"authors\":\"Dawei Liu,&nbsp;Rui Wang,&nbsp;Chengyu Jia,&nbsp;Dingwei Wang,&nbsp;Zhiguo Zhao,&nbsp;Jiaqi Pan,&nbsp;Lei Shi\",\"doi\":\"10.1007/s10854-024-14029-7\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The transparent device in ultrathin NiO layer modified CuI/InGaZnO<sub>4</sub> pn junction is prepared via sputtering-in situ iodization method. The CuI/NiO/InGaZnO<sub>4</sub> exhibits transmittance of ~ 85–90%, photovoltaic enhancement of ~ 1.3 × 10<sup>3</sup>-folds, stable output in 15 days. It can be mainly attributed to the ultrathin NiO layer. Besides appropriate Fermi level can alleviate potential gradient, the ultrathin NiO layer, with surface optimization and p-type carrier injection via Cu<sup>+</sup>/Cu<sup>2+</sup>, Ni<sup>2+</sup>/Ni<sup>3+</sup>-interstitial oxygen synergism, as well as high transparency by wide band gap, can improve the photo-generated carrier kinetic equilibrium for achieving PCE-transparency balance, while exhibiting good stability via the all inorganic structures, making them being competitive in transparent devices.</p></div>\",\"PeriodicalId\":646,\"journal\":{\"name\":\"Journal of Materials Science: Materials in Electronics\",\"volume\":\"35 36\",\"pages\":\"\"},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2024-12-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Materials Science: Materials in Electronics\",\"FirstCategoryId\":\"5\",\"ListUrlMain\":\"https://link.springer.com/article/10.1007/s10854-024-14029-7\",\"RegionNum\":4,\"RegionCategory\":\"工程技术\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materials Science: Materials in Electronics","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s10854-024-14029-7","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

摘要

采用溅射原位碘化法制备了超薄NiO层修饰CuI/InGaZnO4 pn结透明器件。CuI/NiO/InGaZnO4的透过率为~ 85 ~ 90%,光伏增强~ 1.3 × 103倍,15天稳定输出。这主要归因于超薄的NiO层。除了适当的费米能级可以缓解电位梯度外,超薄NiO层通过表面优化和通过Cu+/Cu2+, Ni2+/Ni3+-间隙氧协同作用注入p型载流子,以及宽带隙的高透明度,可以改善光生载流子的动力学平衡,实现pce -透明度平衡,同时通过所有无机结构表现出良好的稳定性,使其在透明器件中具有竞争力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The transparent CuI/InGaZnO4 pn junction toward enhanced photovoltaic response via potential regulation of ultrathin NiO transition layer

The transparent device in ultrathin NiO layer modified CuI/InGaZnO4 pn junction is prepared via sputtering-in situ iodization method. The CuI/NiO/InGaZnO4 exhibits transmittance of ~ 85–90%, photovoltaic enhancement of ~ 1.3 × 103-folds, stable output in 15 days. It can be mainly attributed to the ultrathin NiO layer. Besides appropriate Fermi level can alleviate potential gradient, the ultrathin NiO layer, with surface optimization and p-type carrier injection via Cu+/Cu2+, Ni2+/Ni3+-interstitial oxygen synergism, as well as high transparency by wide band gap, can improve the photo-generated carrier kinetic equilibrium for achieving PCE-transparency balance, while exhibiting good stability via the all inorganic structures, making them being competitive in transparent devices.

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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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