用于 22 纳米 FDSOI 技术低温性能评估的电压基准和稳压器

IF 2.4 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Alfonso R. Cabrera-Galicia;Arun Ashok;Patrick Vliex;Andre Kruth;André Zambanini;Stefan van Waasen
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引用次数: 0

摘要

本文介绍了参考电压和线性稳压器在6k至300k温度范围内的设计和低温电特性。这两种电路都被用作测试载体,用于22 nm FDSOI MOS技术的实验性能评估,并作为开发低温模拟系统的平台,其作用与量子计算(QC)应用相关。此外,我们报告了MOS晶体管低温现象对这些电路的影响,并建议在模拟电路设计中利用这些现象。我们特别关注了低温阈值电压$(V_{\text {th}})$饱和、跨导$(g_{m})$增加和低频(LF)过量噪声。实验结果表明,低温$V_{\text {th}}$饱和和$g_{m}}$增加可以作为电路设计的工具,而低频过量噪声是低温模拟电路的性能障碍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Voltage Reference and Voltage Regulator for the Cryogenic Performance Evaluation of the 22nm FDSOI Technology
This paper presents the design and cryogenic electrical characterization of a voltage reference and a linear voltage regulator at temperatures between 6 K and 300 K. Both circuits are employed as test vehicles for the experimental performance evaluation of the 22 nm FDSOI MOS technology when used as platform for the development of cryogenic analog systems, whose role is relevant in Quantum Computing (QC) applications. Additionally, we report the impact that MOS transistor cryogenic phenomena have over these circuits and propose to take advantage of some of those phenomena in analog circuit design. In particular, we focus on the cryogenic threshold voltage $(V_{\text {th}})$ saturation, the transconductance $(g_{m})$ increase and the low frequency (LF) excess noise. Our experimental results indicate that the cryogenic $V_{\text {th}}$ saturation and the $g_{m}$ increase can be used as circuit design tools, while the LF excess noise is a performance handicap for cryogenic analog circuits.
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