超高压原子层沉积法制备p型半导体用二维碲薄膜

IF 9.1 1区材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY

Nano Letters Pub Date : 2024-12-11 DOI:10.1021/acs.nanolett.4c04363

Dai Cuong Tran, Giang Hoang Pham, Thi Thu Huong Chu, Jiyoung Kim, Jae Kyeong Jeong, Seongil Im, Byoung Hun Lee, Myung Mo Sung

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引用次数: 0

摘要

碲（Te）由于其令人印象深刻的特性，如高迁移率、稳定性和与低温加工的兼容性，已成为二维材料中突出的候选者。然而，在低温下沉积的超薄Te薄膜在大面积上实现一致的均匀性仍然是一个巨大的挑战。原子层沉积（ALD）被认为是一种很有前途的解决方案，即使在低温下也能提供精确的厚度控制和高度适形的薄膜沉积。本研究介绍了一种采用多剂量（MD）策略的高压ALD （HP-ALD）逐层生长Te薄膜的成功方法。所得薄膜的霍尔迁移率为51.2 cm2 V-1 s-1，具有很高的稳定性和良好的表面覆盖率。HP-ALD与MD的集成代表了Te薄膜制造的重大进步，克服了以前的限制，为Te在下一代技术中的更广泛应用铺平了道路。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Layer-by-Layer Growth of Two-Dimensional Tellurium Thin Films via Ultrahigh-Pressure Atomic Layer Deposition for p-Type Semiconductors

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Layer-by-Layer Growth of Two-Dimensional Tellurium Thin Films via Ultrahigh-Pressure Atomic Layer Deposition for p-Type Semiconductors

Tellurium (Te) has emerged as a prominent candidate among two-dimensional materials due to its impressive properties, such as high mobility, stability, and compatibility with low-temperature processing. However, achieving consistent uniformity over large areas for ultrathin Te films deposited at low temperatures has remained a substantial challenge. Atomic layer deposition (ALD) has been proposed as a promising solution, offering precise thickness control and highly conformal thin film deposition even at low temperatures. This study introduces a successful method for the layer-by-layer growth of Te thin films using high-pressure ALD (HP-ALD) with a multiple-dosing (MD) strategy. The resulting films exhibit a promising Hall mobility of 51.2 cm² V^–1 s^–1, alongside high stability and excellent surface coverage. The integration of HP-ALD with MD represents a significant advancement in Te thin film fabrication, overcoming previous limitations and paving the way for the broader utilization of Te in next-generation technologies.

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来源期刊

Nano Letters 工程技术-材料科学：综合

CiteScore

16.80

自引率

2.80%

发文量

1182

审稿时长

1.4 months

期刊介绍： Nano Letters serves as a dynamic platform for promptly disseminating original results in fundamental, applied, and emerging research across all facets of nanoscience and nanotechnology. A pivotal criterion for inclusion within Nano Letters is the convergence of at least two different areas or disciplines, ensuring a rich interdisciplinary scope. The journal is dedicated to fostering exploration in diverse areas, including: - Experimental and theoretical findings on physical, chemical, and biological phenomena at the nanoscale - Synthesis, characterization, and processing of organic, inorganic, polymer, and hybrid nanomaterials through physical, chemical, and biological methodologies - Modeling and simulation of synthetic, assembly, and interaction processes - Realization of integrated nanostructures and nano-engineered devices exhibiting advanced performance - Applications of nanoscale materials in living and environmental systems Nano Letters is committed to advancing and showcasing groundbreaking research that intersects various domains, fostering innovation and collaboration in the ever-evolving field of nanoscience and nanotechnology.