低硼掺杂对BxGa1−xN/SiC外延层结构和光学性能的影响

IF 5.2 3区 材料科学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Cosmin Romanitan, Juras Mickevičius, Florin Comanescu, Raluca Gavrila, Marius Stoian, Pericle Varasteanu, Arunas Kadys, Tadas Malinauskas, Emil-Mihai Pavelescu
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引用次数: 0

摘要

采用金属有机化学气相沉积的方法在SiC衬底上生长出硼含量高达5.6%的BGaN薄膜。采用高分辨率x射线衍射(XRD)、原子力显微镜(AFM)、拉曼光谱(Raman spectroscopy)和光致发光光谱(PL)研究了硼掺杂对结构和光学性能的影响。围绕对称0002和不对称反射的XRD互向空间图可以评估晶格常数和晶格与底层衬底的不匹配。XRD摇摆曲线和AFM测试表明,涂层具有镶嵌结构。评价了硼含量对晶粒尺寸、倾斜度和捻度的影响,并讨论了硼含量与螺纹位错密度的关系。利用拉曼光谱和PL光谱分析了硼含量增加对材料光学性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

The effects of low boron incorporation on the structural and optical properties of BxGa1−xN/SiC epitaxial layers

The effects of low boron incorporation on the structural and optical properties of BxGa1−xN/SiC epitaxial layers

BGaN epilayers with boron contents up to 5.6% were grown on SiC substrates by metal–organic chemical vapor deposition. The effects of boron incorporation on the structural and optical properties were studied by high-resolution X-ray diffraction (XRD), atomic force microscopy (AFM), Raman spectroscopy and photoluminescence (PL) spectroscopy. XRD reciprocal-space maps around the symmetric 0002 and asymmetric reflections allowed evaluation of the lattice constants and lattice mismatch with respect to the underlying substrate. XRD rocking curves and AFM measurements indicated the mosaic microstructure of the epilayer. The impact of boron content on crystallite size, tilt and twist is evaluated and the correlation with threading dislocation density is discussed. The deterioration of optical properties with increasing boron content was assessed by Raman and PL spectroscopy.

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来源期刊
Journal of Applied Crystallography
Journal of Applied Crystallography CHEMISTRY, MULTIDISCIPLINARYCRYSTALLOGRAPH-CRYSTALLOGRAPHY
CiteScore
7.80
自引率
3.30%
发文量
178
期刊介绍: Many research topics in condensed matter research, materials science and the life sciences make use of crystallographic methods to study crystalline and non-crystalline matter with neutrons, X-rays and electrons. Articles published in the Journal of Applied Crystallography focus on these methods and their use in identifying structural and diffusion-controlled phase transformations, structure-property relationships, structural changes of defects, interfaces and surfaces, etc. Developments of instrumentation and crystallographic apparatus, theory and interpretation, numerical analysis and other related subjects are also covered. The journal is the primary place where crystallographic computer program information is published.
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