通过复合印章实现胶体量子点像素阵列的高保真拾放转移印刷

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Luohe Zhou, Xuhao Sun, Jiachen Xie, Song Chen
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引用次数: 0

摘要

转移印花技术能以超高像素密度对发射型胶体量子点(CQD)阵列进行图案化。然而,最常用的拾取贴放法难以实现高图案保真度。在此,我们报告了常规使用的单一复合印章无法兼顾低变形率和保形接触,从而导致了这一难题。为此,我们提出了一种用于 CQD 转移的复合印章。将不同机械参数的 PDMS 堆叠在一起,复合印章的抗变形能力优于由软质 PDMS(Sylgard184)组成的单组分印章,其接触保形性也大大高于由硬质 PDMS 组成的印章。因此,复合印章的转移产量提高了 3.21 倍,图案保真度达到 94.0%,像素直径为 1.78 μm,像素密度为每英寸 6350 个。拾取-贴装工艺还能生产出具有相同图案和合理电致发光性能的量子点发光二极管阵列。这种方法为提高 CQD 阵列的图案质量提供了启示。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

High-Fidelity Pick-and-Place Transfer Printing of Colloidal Quantum Dot Pixel Arrays via a Composite Stamp

High-Fidelity Pick-and-Place Transfer Printing of Colloidal Quantum Dot Pixel Arrays via a Composite Stamp
Transfer printing can pattern emissive colloidal quantum dot (CQD) arrays with ultrahigh pixel density. However, the most used pick-and-place method has difficulty in achieving high pattern fidelity. Here, we report that the regularly used single-composite stamps cannot combine a low deformation rate and conformal contact, leading to the challenge. In response, we propose a composite stamp for the CQD transfer. Stacked with PDMS of different mechanical parameters, the composite stamp outperforms the single-component stamp composed of soft PDMS (Sylgard184) in deformation resistance and exhibits substantially higher contact conformality than that composed of harder PDMS. As a result, the composite stamp exhibits a 3.21-fold enhancement in transfer yield, delivering a pattern fidelity of 94.0% with a pixel diameter of 1.78 μm and a pixel density of 6350 per inch. The pick-and-place process also produces quantum dot light-emitting diode arrays with the same pattern and reasonable electroluminescence performance. This method provides insight into improving CQD arrays’ pattern quality.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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