石墨烯/SiC 中茚插层的全光学质量控制

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2024-11-25 DOI:10.1063/5.0237088

Cedric Schmitt, Simone Sotgiu, Stefan Enzner, Jonas Erhardt, Elena Stellino, Domenico Di Sante, Giorgio Sangiovanni, Ralph Claessen, Simon Moser, Leonetta Baldassarre

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引用次数: 0

摘要

将二维量子材料夹杂在石墨烯薄片下，可有效保护环境，并有助于原位设备制造。然而，开发功能器件需要快速、大规模的筛选方法来评估夹杂物的质量，而迄今为止，只能通过缓慢的、基于超高真空的表面科学技术来监测夹杂物的质量。在这项研究中，我们利用原位拉曼微光谱技术，对量子自旋霍尔绝缘体茚，即夹在碳化硅（0001）基底和单层石墨烯之间的单层铟，进行了光学和非破坏性鉴定。颜色调制与茚的独特低频拉曼指纹相结合，可快速评估其均匀性和结晶质量。密度泛函扰动理论表明，这种拉曼特征主要源于茚的剪切和呼吸模式，而其他高阶模式则暂时归因于缺陷辅助和双声子拉曼过程。

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All-optical quality control of indenene intercalation into graphene/SiC

Intercalating two-dimensional quantum materials beneath a sheet of graphene provides effective environmental protection and facilitates ex situ device fabrication. However, developing a functional device requires rapid, large-scale screening methods to evaluate the quality of the intercalant, which to date can be monitored only by slow, ultra-high vacuum-based surface science techniques. In this study, we utilize ex situ Raman micro-spectroscopy to optically and nondestructively identify the quantum spin Hall insulator indenene, a monolayer of indium sandwiched between a SiC(0001) substrate and a single sheet of graphene. Color modulation combined with indenene's distinctive low-frequency Raman fingerprint enables rapid assessment of its homogeneity and crystalline quality. Density functional perturbation theory indicates that this Raman signature originates mainly from indenene's shear and breathing modes, while additional higher order modes are tentatively attributed to defect-assisted and two-phonon Raman processes.

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.