用于有机染料 Fenton 类降解的铁基整体催化剂:Fe2(OH)3Cl 物种的重要作用

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Shixian Huang , Hongbo Yao , Helen J. Sun , Hanxi Xiao , Xiao Liu , Chuanbo Hu , Jianting Tang , Joe R. Zhao
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引用次数: 0

摘要

铁基异相催化剂在废水处理的 Fenton 类反应中具有广阔的应用前景,但其可回收性阻碍了其实际应用,而且其高性能的基本起源机制和结构-活性关系仍有待进一步阐明。本文利用 NH4Cl 添加剂制备了一系列含 Fe2(OH)3Cl 的整体石催化剂,当 H2O2 作为氧化剂时,这些催化剂在亚甲基蓝和罗丹明 B 的 Fenton 类降解中的性能明显高于 Fe3O4 催化剂。含 Fe2(OH)3Cl 的整体催化剂可在降解实验中重复使用四次,而其活性不会大幅降低。对催化降解过程中产生的活性自由基进行了研究。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Fe-based monolithic catalysts for Fenton-like degradation of organic dyes: The important role of Fe2(OH)3Cl species
Fe-based heterogeneous catalysts are promising in Fenton-like reactions for wastewater treatment, but their practical application is hindered by their recyclability, and the fundamental mechanisms for origin of the high performance and the structure-activity relationships remain to be elucidated further. In this paper, we prepared a series of Fe2(OH)3Cl-containing monolith catalysts by the use of NH4Cl additives, which gave significantly higher performance than the Fe3O4 counterparts in Fenton-like degradation of methylene blue and rhodamine B when H2O2 was used as oxidant. The Fe2(OH)3Cl-containing monolith catalyst can be reused four cycles in the degradation experiments without big loss in their activity. The active radicals generated during process of the catalytic degradation were studied.
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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