生长坚硬的新型 CVD 多层涂层：TiN 上 (Ti,Al)N 上的 Ti(C,N)

IF 4.2 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

International Journal of Refractory Metals & Hard Materials Pub Date : 2024-11-17 DOI:10.1016/j.ijrmhm.2024.106966

Mohamed Ben Hassine , Hans-Olof Andrén , Anand H.S. Iyer , Olof Bäcke , Dirk Stiens , Wiebke Janssen , Johannes Kümmel , Mats Halvarsson

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引用次数: 0

摘要

一种用于切削应用的新型化学气相沉积（CVD）多层涂层旨在实现金属加工过程中的高耐磨性和耐热性。涂层由三层组成：TiCN 层沉积在 TiAlN 层之上，TiAlN 层生长在沉积在硬质合金基底上的 TiN 层上。涂层的详细微观结构通过电子显微镜技术进行了检测。观察到两种金字塔形的表面形态和纹理，这可能与基底粗糙度有关。发现了两种生长模式：211〉取向 TiCN 在 <211> 取向 TiAlN 在 <211> 取向 TiN 上的外延生长，导致涂层表面出现倾斜的 TiCN 金字塔；以及〈111〉TiCN 在 <111> TiAlN 在 <111> TiN 上的外延生长，导致涂层表面出现对称的 TiCN 金字塔。

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Growth of a hard, novel CVD multilayer coating: Ti(C,N) on (Ti,Al)N on TiN

A novel chemical vapor deposition (CVD) multilayer coating intended for cutting applications was designed to achieve high wear and heat resistance during metal machining. The coating consists of three layers: a TiCN layer deposited on top of a TiAlN layer, which was grown on a layer of TiN that was deposited onto a cemented carbide substrate. The detailed microstructure of the coating was examined using a combination of electron microscope techniques. Two pyramidal surface morphologies and textures were observed, which could be related to the substrate roughness. Two growth modes were found: epitaxial growth of 〈211〉 oriented TiCN on <211> oriented TiAlN on <211> oriented TiN, leading to tilted TiCN pyramids at the coating surface; and epitaxial growth of 〈111〉 TiCN on <111> TiAlN on <111> TiN, leading to symmetrical TiCN pyramids at the coating surface.

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来源期刊

$International Journal of Refractory Metals & Hard Materials$

International Journal of Refractory Metals & Hard Materials 工程技术-材料科学：综合

CiteScore

7.00

自引率

13.90%

发文量

236

审稿时长

35 days

期刊介绍： The International Journal of Refractory Metals and Hard Materials (IJRMHM) publishes original research articles concerned with all aspects of refractory metals and hard materials. Refractory metals are defined as metals with melting points higher than 1800 °C. These are tungsten, molybdenum, chromium, tantalum, niobium, hafnium, and rhenium, as well as many compounds and alloys based thereupon. Hard materials that are included in the scope of this journal are defined as materials with hardness values higher than 1000 kg/mm2, primarily intended for applications as manufacturing tools or wear resistant components in mechanical systems. Thus they encompass carbides, nitrides and borides of metals, and related compounds. A special focus of this journal is put on the family of hardmetals, which is also known as cemented tungsten carbide, and cermets which are based on titanium carbide and carbonitrides with or without a metal binder. Ceramics and superhard materials including diamond and cubic boron nitride may also be accepted provided the subject material is presented as hard materials as defined above.