Hwiwon Seo , Haneul Lee , Ji-Won Kwon , Gwanjoong Kim , Ingyu Lee , Gon-Ho Kim
{"title":"Ar/O2电感耦合等离子体中的电子热特性分析:利用朗缪尔探针数据进行全局模型模拟","authors":"Hwiwon Seo , Haneul Lee , Ji-Won Kwon , Gwanjoong Kim , Ingyu Lee , Gon-Ho Kim","doi":"10.1016/j.cap.2024.11.003","DOIUrl":null,"url":null,"abstract":"<div><div>This study investigates the electron thermal properties in Argon and Ar/O2 inductively coupled plasmas using global model based on Langmuir probe data. The sensor-data driven global model (GM) is improved to simulate the power coupling efficiency and an electron energy distribution simultaneously. It reveals that the heating characteristic changes the thermal state and radical generation with input power, pressure and gas mixture ratio. The analysis results of probe data from the global model provide information on the plasma thermal characteristics under efficient operating conditions of process plasma. It provides the advantage of offering insights into the causes of variations in the plasma thermal equilibrium state with operating conditions in ICP, which are limited to obtain from the sensor or the general GM. This makes it highly promising as a simulation method for developing process recipes.</div></div>","PeriodicalId":11037,"journal":{"name":"Current Applied Physics","volume":"70 ","pages":"Pages 27-40"},"PeriodicalIF":2.4000,"publicationDate":"2024-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Analysis of electron thermal properties in Ar/O2 inductively coupled plasmas: A global model simulation using Langmuir probe data\",\"authors\":\"Hwiwon Seo , Haneul Lee , Ji-Won Kwon , Gwanjoong Kim , Ingyu Lee , Gon-Ho Kim\",\"doi\":\"10.1016/j.cap.2024.11.003\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><div>This study investigates the electron thermal properties in Argon and Ar/O2 inductively coupled plasmas using global model based on Langmuir probe data. The sensor-data driven global model (GM) is improved to simulate the power coupling efficiency and an electron energy distribution simultaneously. It reveals that the heating characteristic changes the thermal state and radical generation with input power, pressure and gas mixture ratio. The analysis results of probe data from the global model provide information on the plasma thermal characteristics under efficient operating conditions of process plasma. It provides the advantage of offering insights into the causes of variations in the plasma thermal equilibrium state with operating conditions in ICP, which are limited to obtain from the sensor or the general GM. This makes it highly promising as a simulation method for developing process recipes.</div></div>\",\"PeriodicalId\":11037,\"journal\":{\"name\":\"Current Applied Physics\",\"volume\":\"70 \",\"pages\":\"Pages 27-40\"},\"PeriodicalIF\":2.4000,\"publicationDate\":\"2024-11-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Current Applied Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1567173924002414\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Current Applied Physics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1567173924002414","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Analysis of electron thermal properties in Ar/O2 inductively coupled plasmas: A global model simulation using Langmuir probe data
This study investigates the electron thermal properties in Argon and Ar/O2 inductively coupled plasmas using global model based on Langmuir probe data. The sensor-data driven global model (GM) is improved to simulate the power coupling efficiency and an electron energy distribution simultaneously. It reveals that the heating characteristic changes the thermal state and radical generation with input power, pressure and gas mixture ratio. The analysis results of probe data from the global model provide information on the plasma thermal characteristics under efficient operating conditions of process plasma. It provides the advantage of offering insights into the causes of variations in the plasma thermal equilibrium state with operating conditions in ICP, which are limited to obtain from the sensor or the general GM. This makes it highly promising as a simulation method for developing process recipes.
期刊介绍:
Current Applied Physics (Curr. Appl. Phys.) is a monthly published international journal covering all the fields of applied science investigating the physics of the advanced materials for future applications.
Other areas covered: Experimental and theoretical aspects of advanced materials and devices dealing with synthesis or structural chemistry, physical and electronic properties, photonics, engineering applications, and uniquely pertinent measurement or analytical techniques.
Current Applied Physics, published since 2001, covers physics, chemistry and materials science, including bio-materials, with their engineering aspects. It is a truly interdisciplinary journal opening a forum for scientists of all related fields, a unique point of the journal discriminating it from other worldwide and/or Pacific Rim applied physics journals.
Regular research papers, letters and review articles with contents meeting the scope of the journal will be considered for publication after peer review.
The Journal is owned by the Korean Physical Society.