等离子体辅助在 N-TiO2/WO3 S 型异质结中构建瀑布型 IEF，实现可见光驱动的 Cl-VOCs 高效降解

IF 8.1 1区工程技术 Q1 ENGINEERING, CHEMICAL

Separation and Purification Technology Pub Date : 2024-11-19 DOI:10.1016/j.seppur.2024.130626

Ran Sun, Yujie Tan, Wei Zhao, Lijie Song, Ruina Zhang, Xingang Liu, Jianyuan Hou, Yuan Yuan, Feng Qin, Danyan Cen, Renxi Zhang

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引用次数: 0

摘要

构建具有强大内电场 (IEF) 的 S 型异质结以增强对氯化挥发性有机化合物 (Cl-VOC) 的光催化降解是一项重大挑战。在本文中，首先合成了一种创新的 S 型异质结，该异质结由掺杂 N 的二氧化钛（TiO2）和具有丰富氧空位（OV）的三氧化钨（WO3）组成，并通过一种环保型两步等离子体进行操作。利用 UV-Vis DRS、XPS、UPS 和 EPR 测量分析了 TiO2 和 WO3 之间的电荷转移途径，证实了 S 型异质结的成功形成。有趣的是，为了区分调节前后的 IEF 强度，首次提出了两种新的 IEF 类型：流型和瀑布型。在可见光条件下，最佳配比（4.66% 的氮和 5 wt% 的 WO3）的 5NTW 对氯苯的降解效率和二氧化碳矿化率最高，分别达到 95.4% 和 94.1%。性能的提高归因于掺氮改变了 TiO2 的电子结构和功函数，增强了与 WO3 的费米级差（ΔEf）。同时，等离子体处理使催化剂的表面形貌变得粗糙，增加了 OV 的含量，而 OV 可作为电荷陷阱并增强活性位点。这些协同作用使 TW 的流型 IEF 转变为 5NTW 的瀑布型 IEF。KPFM、zeta 电位测试和 DFT 计算证实，瀑布型 IEF 的 IEF 强度和电子转移次数分别是流式 IEF 的 3.17 倍和 2.04 倍。这一策略突破了以往工作的局限性，为综合优化光催化剂以获得更优异的性能提供了新的视角，同时也进一步拓宽了非热等离子体技术的应用前景。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

Plasma-Assisted construction of waterfall-type IEF in N-TiO2/WO3 S-scheme heterojunction for efficient Visible-Light-Driven degradation of Cl-VOCs

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Plasma-Assisted construction of waterfall-type IEF in N-TiO2/WO3 S-scheme heterojunction for efficient Visible-Light-Driven degradation of Cl-VOCs

Constructing S-scheme heterojunctions with a robust internal electric field (IEF) to enhance the photocatalytic degradation of chlorinated volatile organic compounds (Cl-VOCs) presents a significant challenge. Herein, an innovative S-scheme heterojunction of N-doped titanium dioxide (TiO₂) and tungsten trioxide (WO₃) with abundant oxygen vacancies (OVs) was first synthesized and manipulated via an eco-friendly two-step plasma. The charge transfer pathway between TiO₂ and WO₃ was analyzed using UV–Vis DRS, XPS, UPS, and EPR measurements, confirming the successful formation of the S-scheme heterojunction. Interestingly, two novel types of IEF: stream-type and waterfall-type were first proposed to distinguish the IEF strength before and after regulation. Under visible light, 5NTW with the optimal ratio (4.66 at% nitrogen and 5 wt% WO₃) achieved the highest degradation efficiency and carbon dioxide mineralization rate of 95.4% and 94.1% for chlorobenzene, respectively. The performance enhancement was attributed to the fact that N-doping modifies the electronic structure and work function of TiO₂, enhancing the Fermi level difference (ΔE_f) with WO₃. Meanwhile, the plasma treatment roughened the surface topography of the catalyst and increased the content of OVs, which serve as charge traps and bolster active sites. These synergies led to a transformation from a stream-type IEF of TW to a waterfall-type IEF of 5NTW. KPFM, zeta potential tests, and DFT calculations confirmed that the IEF strength and the number of electron transfers in the waterfall-type IEF are 3.17 and 2.04 times greater, respectively, than those in the stream-type IEF. This strategy transcends the limitations of previous work, offering a novel perspective on the integrated optimization of photocatalysts for superior performance and also further broadens the application prospects of nonthermal plasma technology.

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来源期刊

Separation and Purification Technology 工程技术-工程：化工

CiteScore

14.00

自引率

12.80%

发文量

2347

审稿时长

43 days

期刊介绍： Separation and Purification Technology is a premier journal committed to sharing innovative methods for separation and purification in chemical and environmental engineering, encompassing both homogeneous solutions and heterogeneous mixtures. Our scope includes the separation and/or purification of liquids, vapors, and gases, as well as carbon capture and separation techniques. However, it's important to note that methods solely intended for analytical purposes are not within the scope of the journal. Additionally, disciplines such as soil science, polymer science, and metallurgy fall outside the purview of Separation and Purification Technology. Join us in advancing the field of separation and purification methods for sustainable solutions in chemical and environmental engineering.