B/N 双掺杂对 Mo-S-B-N 溅射薄膜机械和摩擦学特性的影响

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-11-06 DOI:10.1016/j.vacuum.2024.113803

Ningxin Wei , Hang Li , Jianliang Li , Jiewen Huang , Jian Kong , Qiujie Wu , Huaping Tan , Yan Shi , Dangsheng Xiong

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引用次数: 0

摘要

掺杂非金属元素可有效改善多孔形态，提高基于过渡金属二卤化物（TMDs）的薄膜的机械和摩擦学性能。然而，使用单一添加剂的 TMDs 基薄膜应进一步提高机械性能，以获得更好的耐磨性。本研究采用 B/N 双掺杂法进一步提高磁控溅射法沉积的 MoS2 基薄膜的抗变形性和韧性，同时研究了 B/N 掺杂剂对薄膜结构、机械性能和摩擦学性能的影响。Mo-S-B-N 薄膜的 B 含量为 20.91 at.%和 N 含量为 18.13 at.%的 Mo-S-B-N 薄膜由 MoS2 和无定形氮化物/硼化物组成，与 B 掺杂薄膜相比，B/N 双掺杂薄膜形成了更高有序的 MoS2 层状结构。该薄膜的硬度为 11.6 ± 0.9 GPa，韧性得到了改善，磨损率较低，平均摩擦系数也得到了提高。B/N 双掺杂薄膜与 B 掺杂薄膜相比，摩擦层形成稳定，抗变形能力更强，因此摩擦稳定，耐磨性提高，而有限的 TMDs 重新定向导致摩擦系数略有增加。

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Effect of B/N dual doping on mechanical and tribological properties of Mo-S-B-N sputtered films

Doping with non-metal element is effective to improve the porous morphology and enhance the mechanical and tribological properties of transition metal dichalcogenides (TMDs) based film. However, the mechanical properties of TMDs based film with single additive should be enhanced further for better wear resistance. In this work, B/N dual-doping was used to further enhance the deformation resistance and toughness of MoS₂ based films deposited by magnetron sputtering, while the effect of B/N dopants on the structure, mechanical and tribological properties has been investigated. Mo-S-B-N film with B content of 20.91 at. % and N content of 18.13 at. % consists of MoS₂ and amorphous nitride/boride, in which B/N dual doping film forms a higher ordered MoS₂ lamellar structure compared to B doping film. With a hardness of 11.6 ± 0.9 GPa and improved toughness, the film achieves a low wear rate and average friction coefficient is achieved. Comparing B/N dual doping film to B doping film, the stable formation of tribolayer with more strengthened deformation resistance results in the steady friction and the improved wear resistance, while the limited TMDs reorientation leads to the slight increase of friction coefficient.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.