激光产生的等离子体极紫外源的光学深度表征

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-11-05 DOI:10.1016/j.vacuum.2024.113805

Tianze Wang , Zhenlin Hu , Liang He , Nan Lin , Yuxin Leng , Weibiao Chen

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引用次数: 0

摘要

本研究探讨了激光产生的等离子体极紫外源（LPP-EUV）的发射机制。实验中，超紫外辐射是由波长为 1064 nm 的激光与板状 Sn 靶相互作用产生的。超紫外辐射由超紫外能量监测器和超紫外光谱仪表征。等离子体发射-吸收层模型探讨了 CE 与激光强度和等离子体相对光学深度的关系。等离子体电子密度的光学干涉测量首次证实了这种依赖关系。我们的工作为表征和优化激光驱动超紫外光源的光学深度提供了一种方法。

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Characterization of optical depth for laser produced plasma extreme ultraviolet source

This study investigates the emission mechanism of laser-produced plasma extreme ultraviolet source (LPP-EUV). In the experiment, the EUV radiation is generated by a 1064 nm laser interacting with slab Sn target. The EUV emission is characterized by EUV energy monitors and an EUV spectrometer. The dependency of CE on laser intensity and plasma relative optical depth is explored by a plasma emission-absorption layer model. The dependency is confirmed by an optical interferometry measurement of plasma electron density for the first time. Our work provides a method for characterizing and optimizing the optical depth of laser driven EUV source.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.