嵌入式 LaB6 铋空心阴极的实验和零维模拟研究

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2024-11-05 DOI:10.1016/j.vacuum.2024.113807

Dongsheng Cai , Pingyang Wang , Zhiwei Hua

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引用次数: 0

摘要

实验和零维模拟评估了嵌入式 LaB6 铋空心阴极的放电性能。实验结果表明，嵌入式铋空心阴极可在二极管模式下工作，无需任何外部加热，质量流量约为 0.21 mg/s。模拟结果表明，在相同的质量流率下，铋空心阴极插入区的电子和离子密度高于氙，而孔口区则相反。值得注意的是，当放电电流低于 4 安培时，铋在插入区和孔口区的功率沉积均低于氙，这表明侵蚀作用减弱。

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Experimental and zero-dimensional simulation study of an embedded bismuth LaB6 hollow cathode

Experiments and zero-dimensional simulation were conducted to evaluate the discharge performance of an embedded bismuth LaB₆ hollow cathode. The experimental results demonstrate that the embedded bismuth hollow cathode can operate in diode mode without any external heating, with a mass flow rate of approximately 0.21 mg/s. In Keeper-cathode mode, the discharge voltage for bismuth was slightly lower than that of xenon and exhibited strong stability, with a maximum discharge variation of less than 0.5 V at a discharge current of 2 A. The simulation results showed that at the same mass flow rate, the electron and ion densities in the insert region of the bismuth hollow cathode were higher than those of xenon, whereas the opposite was true for the orifice region. Notably, at discharge currents below 4 A, the power deposition of bismuth in both the insert and orifice regions was lower than that of xenon, indicating reduced erosion.

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.