碳化硅晶体气孔 X 射线截面拓扑计算机模拟

IF 0.6 4区 材料科学 Q4 CRYSTALLOGRAPHY
V. G. Kohn
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引用次数: 0

摘要

本文首次报道了对碳化硅晶体中气孔在剖面拓扑图(即窄 X 射线束在晶体中的衍射过程)上的图像进行计算机模拟的结果。模拟是使用通用计算机程序 XRWP 的一个特殊模块进行的。该程序由作者开发,用于计算相干 X 射线光学效应。计算方法结合了之前已知的两种方法,特别是傅立叶变换法(加藤法)和高木-陶平方程求解法。结果表明,气孔可以产生各种各样的图像,这取决于实验条件和晶体内部的气孔位置。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

Computer Simulation of X-ray Section Topography of Gas Pores in a Silicon Carbide Crystal

Computer Simulation of X-ray Section Topography of Gas Pores in a Silicon Carbide Crystal

The results of computer simulation of images of gas pores in a silicon carbide crystal in section topograms, i.e., during diffraction of a narrow X-ray beam in the crystal, are reported for the first time. The simulation was performed using a special module of the universal computer program XRWP. This program is being developed by the author to calculate the effects of coherent X-ray optics. The calculation method combines two previously known methods, specifically, the Fourier transform method (Kato method) and the method of solving the Takagi–Taupin equations. It is shown that gas pores can produce a wide variety of images, depending on the experimental conditions and the pore position inside the crystal.

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来源期刊
Crystallography Reports
Crystallography Reports 化学-晶体学
CiteScore
1.10
自引率
28.60%
发文量
96
审稿时长
4-8 weeks
期刊介绍: Crystallography Reports is a journal that publishes original articles short communications, and reviews on various aspects of crystallography: diffraction and scattering of X-rays, electrons, and neutrons, determination of crystal structure of inorganic and organic substances, including proteins and other biological substances; UV-VIS and IR spectroscopy; growth, imperfect structure and physical properties of crystals; thin films, liquid crystals, nanomaterials, partially disordered systems, and the methods of studies.
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