环境稳定型 β-InSe 氧化变化的起源。

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
ACS Applied Materials & Interfaces Pub Date : 2024-11-27 Epub Date: 2024-11-12 DOI:10.1021/acsami.4c15577
Eunji Sim, Dongwook Kim, Thi Huong Nguyen, Jehan Kim, Ha Eun Cho, Somang Koo, Sunglae Cho, Ji Hoon Shim, Seong Chu Lim, Kyuwook Ihm
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引用次数: 0

摘要

在层状材料实际应用于设备的最后阶段,了解和控制层状材料的氧化仍然是关键问题。层状材料通过消除反转对称性实现带隙。然而,氧化过程变得复杂,人们对这些材料的氧化过程还没有完全了解。作为一个具有代表性的例子,铟硒因其高电荷迁移率和类似硅的带隙而备受关注。然而,关于硒和铟的氧化等相互矛盾的观察结果,包括对氧化敏感性的对比评估,都有报道。在本研究中,我们报告了原位光谱结果,详细说明了各种氧化途径的起源。我们观察到,在低缺陷密度下,由于硒空位导致硒化铟的反应势垒降低,从而导致氧气吸附,而随着缺陷的增加,铟的较低电负性则成为氧化的新途径。在低缺陷密度条件下,体层在能量上更有利于吸附氧气,从而使氧气扩散到足以形成伪超结的深度,并使表层似乎具有抗氧化性。我们的研究结果回答了为什么由此产生的光学响应多样性会增加,以及实现气体稳定性的策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Origin of Oxidation Variations in Ambient-Stable β-InSe.

Understanding and controlling the oxidation of layered materials remain critical issues in the final stages of their practical application in devices. Layered materials achieve a band gap by removing inversion symmetry. However, the oxidation process becomes complex, and the oxidation of these materials is not yet fully understood. As a representative example, InSe has attracted considerable attention due to its high charge mobility and Si-like band gap. However, conflicting observations such as oxidation by Se and In have been reported, including contrasting assessments of the oxidation susceptibility. In this study, we report in situ spectroscopy results detailing the origins of various oxidation pathways. We observed that at low defect densities the reduced reaction barrier of InSe due to Se vacancies leads to oxygen adsorption, while as defects increase, the lower electronegativity of In rises as a new pathway for oxidation. At low defect density, the bulk layer was more energetically favored for oxygen adsorption, allowing oxygen to diffuse to a depth sufficient to form pseudoheterojunctions and making the surface layer seemingly resistant to oxidation. Our results provide an answer to why the resulting diversity of optical responses is expected to increase as well as strategies to achieve gas stability.

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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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