Haofei Zheng, Lingqi Li, Yu-Chieh Chien, Jie Yang, Sifan Li, Samarth Jain, Heng Xiang, Mingxi Chen, Jianwei Chai, Yinfeng Long, Mei Er Pam, Lin Wang, Dongzhi Chi, Kah-Wee Ang
{"title":"基于晶圆级二维 HfS2 的 Memristor 阵列,可实现双模物理不可克隆功能","authors":"Haofei Zheng, Lingqi Li, Yu-Chieh Chien, Jie Yang, Sifan Li, Samarth Jain, Heng Xiang, Mingxi Chen, Jianwei Chai, Yinfeng Long, Mei Er Pam, Lin Wang, Dongzhi Chi, Kah-Wee Ang","doi":"10.1021/acsami.4c11340","DOIUrl":null,"url":null,"abstract":"Conventional Si-based physically unclonable functions (PUFs) take advantage of the unique variations in the fabrication processes. However, these PUFs are hindered by limited entropy sources and susceptibility to noise interference. Here we present a memristive device based on wafer-scale (2-in.) two-dimensional (2D) hafnium disulfide (HfS<sub>2</sub>) grown by molecular beam epitaxy (MBE). The polycrystalline HfS<sub>2</sub> thin film can offer enhanced entropy sources for PUF applications, such as lattice defects, which can facilitate the random formation of conductive filaments and result in significant device-to-device (D2D) variations. Our proposed PUF design seamlessly integrates two distinct operating modes within a single circuit module. First, a reconfigurable and highly secure mode 1, and second, an ultrareliable mode 2, both with near-ideal Entropy (∼1.0), normalized Hamming distance (∼0.5) and correlation coefficient (∼0.0). Additionally, a predictive Fourier regression model further confirms the unpredictable nature of our dual-mode PUF, with an average prediction accuracy of ∼50%.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":null,"pages":null},"PeriodicalIF":8.3000,"publicationDate":"2024-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Memristor Array Based on Wafer-Scale 2D HfS2 for Dual-Mode Physically Unclonable Functions\",\"authors\":\"Haofei Zheng, Lingqi Li, Yu-Chieh Chien, Jie Yang, Sifan Li, Samarth Jain, Heng Xiang, Mingxi Chen, Jianwei Chai, Yinfeng Long, Mei Er Pam, Lin Wang, Dongzhi Chi, Kah-Wee Ang\",\"doi\":\"10.1021/acsami.4c11340\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Conventional Si-based physically unclonable functions (PUFs) take advantage of the unique variations in the fabrication processes. However, these PUFs are hindered by limited entropy sources and susceptibility to noise interference. Here we present a memristive device based on wafer-scale (2-in.) two-dimensional (2D) hafnium disulfide (HfS<sub>2</sub>) grown by molecular beam epitaxy (MBE). The polycrystalline HfS<sub>2</sub> thin film can offer enhanced entropy sources for PUF applications, such as lattice defects, which can facilitate the random formation of conductive filaments and result in significant device-to-device (D2D) variations. Our proposed PUF design seamlessly integrates two distinct operating modes within a single circuit module. First, a reconfigurable and highly secure mode 1, and second, an ultrareliable mode 2, both with near-ideal Entropy (∼1.0), normalized Hamming distance (∼0.5) and correlation coefficient (∼0.0). Additionally, a predictive Fourier regression model further confirms the unpredictable nature of our dual-mode PUF, with an average prediction accuracy of ∼50%.\",\"PeriodicalId\":5,\"journal\":{\"name\":\"ACS Applied Materials & Interfaces\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":8.3000,\"publicationDate\":\"2024-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ACS Applied Materials & Interfaces\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1021/acsami.4c11340\",\"RegionNum\":2,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q1\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsami.4c11340","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Memristor Array Based on Wafer-Scale 2D HfS2 for Dual-Mode Physically Unclonable Functions
Conventional Si-based physically unclonable functions (PUFs) take advantage of the unique variations in the fabrication processes. However, these PUFs are hindered by limited entropy sources and susceptibility to noise interference. Here we present a memristive device based on wafer-scale (2-in.) two-dimensional (2D) hafnium disulfide (HfS2) grown by molecular beam epitaxy (MBE). The polycrystalline HfS2 thin film can offer enhanced entropy sources for PUF applications, such as lattice defects, which can facilitate the random formation of conductive filaments and result in significant device-to-device (D2D) variations. Our proposed PUF design seamlessly integrates two distinct operating modes within a single circuit module. First, a reconfigurable and highly secure mode 1, and second, an ultrareliable mode 2, both with near-ideal Entropy (∼1.0), normalized Hamming distance (∼0.5) and correlation coefficient (∼0.0). Additionally, a predictive Fourier regression model further confirms the unpredictable nature of our dual-mode PUF, with an average prediction accuracy of ∼50%.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.