{"title":"通过 Q 型 H-POSS 的自聚合实现具有高热稳定性和低介电常数的交联硅倍半氧烷","authors":"Zaoxia Wen, Liang Xu, Xingyu Liu, Linxuan Fang, Lianbin Wu","doi":"10.1016/j.polymer.2024.127843","DOIUrl":null,"url":null,"abstract":"A novel method was developed for constructing cross-linked Silsesquioxane, utilizing Q-type H-POSS as a precursor. The Piers-Rubinsztajn (P-R) like reaction of Q-type H-POSS was catalyzed by B(C<sub>6</sub>F<sub>5</sub>)<sub>3</sub>, resulting in the production of a prepolymer containing partial Si-H. Upon heating at high temperature in air, the prepolymer transformed into an insoluble and infusible cross-linked polymer, named Cured poly(H-POSS). This polymer exhibited high thermostability, with a 5% weight loss temperature (<em>T</em><sub>5d</sub>) of 709 °C and a residue of 92% at 800 °C. Additionally, Cured poly(H-POSS) exhibited high transparency, with a transmittance of 90% in the 400-800 nm wavelength range, and favorable dielectric properties, with a dielectric constant (<em>D</em><sub>k</sub>) of 2.88 at 14 GHz.","PeriodicalId":405,"journal":{"name":"Polymer","volume":null,"pages":null},"PeriodicalIF":4.1000,"publicationDate":"2024-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Crosslinked Silsesquioxane with High Thermal Stability and Low Dielectric Constant by the Autopolymerization of Q-type H-POSS\",\"authors\":\"Zaoxia Wen, Liang Xu, Xingyu Liu, Linxuan Fang, Lianbin Wu\",\"doi\":\"10.1016/j.polymer.2024.127843\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A novel method was developed for constructing cross-linked Silsesquioxane, utilizing Q-type H-POSS as a precursor. The Piers-Rubinsztajn (P-R) like reaction of Q-type H-POSS was catalyzed by B(C<sub>6</sub>F<sub>5</sub>)<sub>3</sub>, resulting in the production of a prepolymer containing partial Si-H. Upon heating at high temperature in air, the prepolymer transformed into an insoluble and infusible cross-linked polymer, named Cured poly(H-POSS). This polymer exhibited high thermostability, with a 5% weight loss temperature (<em>T</em><sub>5d</sub>) of 709 °C and a residue of 92% at 800 °C. Additionally, Cured poly(H-POSS) exhibited high transparency, with a transmittance of 90% in the 400-800 nm wavelength range, and favorable dielectric properties, with a dielectric constant (<em>D</em><sub>k</sub>) of 2.88 at 14 GHz.\",\"PeriodicalId\":405,\"journal\":{\"name\":\"Polymer\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":4.1000,\"publicationDate\":\"2024-11-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Polymer\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://doi.org/10.1016/j.polymer.2024.127843\",\"RegionNum\":2,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"POLYMER SCIENCE\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Polymer","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1016/j.polymer.2024.127843","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}
Crosslinked Silsesquioxane with High Thermal Stability and Low Dielectric Constant by the Autopolymerization of Q-type H-POSS
A novel method was developed for constructing cross-linked Silsesquioxane, utilizing Q-type H-POSS as a precursor. The Piers-Rubinsztajn (P-R) like reaction of Q-type H-POSS was catalyzed by B(C6F5)3, resulting in the production of a prepolymer containing partial Si-H. Upon heating at high temperature in air, the prepolymer transformed into an insoluble and infusible cross-linked polymer, named Cured poly(H-POSS). This polymer exhibited high thermostability, with a 5% weight loss temperature (T5d) of 709 °C and a residue of 92% at 800 °C. Additionally, Cured poly(H-POSS) exhibited high transparency, with a transmittance of 90% in the 400-800 nm wavelength range, and favorable dielectric properties, with a dielectric constant (Dk) of 2.88 at 14 GHz.
期刊介绍:
Polymer is an interdisciplinary journal dedicated to publishing innovative and significant advances in Polymer Physics, Chemistry and Technology. We welcome submissions on polymer hybrids, nanocomposites, characterisation and self-assembly. Polymer also publishes work on the technological application of polymers in energy and optoelectronics.
The main scope is covered but not limited to the following core areas:
Polymer Materials
Nanocomposites and hybrid nanomaterials
Polymer blends, films, fibres, networks and porous materials
Physical Characterization
Characterisation, modelling and simulation* of molecular and materials properties in bulk, solution, and thin films
Polymer Engineering
Advanced multiscale processing methods
Polymer Synthesis, Modification and Self-assembly
Including designer polymer architectures, mechanisms and kinetics, and supramolecular polymerization
Technological Applications
Polymers for energy generation and storage
Polymer membranes for separation technology
Polymers for opto- and microelectronics.