沉积温度对用于光伏应用的喷涂 (040) 拉伸硫化锡薄膜载流子传输的影响

IF 2.5 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
J. Vijaya Raja Sekaran, L. Amalraj, K. Vijayakumar
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引用次数: 0

摘要

以脱水氯化锡和 CS (NH2)2 为前驱体,在不同的基底温度(250-325 ℃)下,以 25 ℃ 为单位,在玻璃基底上喷涂硫化锡 (SnS) 薄膜。研究了所有制备的 SnS 薄膜的物理性质。薄膜的基底温度升高,显示出 (040) 面的正交结晶度增加。使用 Debye-Scherer 公式确定了晶粒尺寸,其范围为 20 至 29 nm。通过形态学、能量色散 X 射线光谱(EDS)和三维原子力显微镜显微照片来了解薄膜的形态和表面粗糙度。光学透射光谱(500 nm-1100 nm)显示,所有薄膜的直接带隙值都符合光电应用的适当范围。在傅立叶变换红外光谱的吸收带中,分析了 SnS 薄膜的特征拉伸振动模式。在 325 °C 下生成的薄膜电阻率最低,为 4.28 Ω cm,空穴浓度约为 1013 cm-3。随着薄膜生长温度的升高,电阻率迅速降低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of deposition temperature on carrier transportation of sprayed (040) oriented tin sulfide thin films for photovoltaic applications

Sprayed thin coatings of tin sulphide (SnS) onto glass substrates utilizing tin chloride dehydrate and CS (NH2)2 as precursors, in various substrate temperatures (250–325 °C) in steps of 25 °C. The physical properties were studied for all the as prepared SnS thin films. The increased substrate temperature on the film shows the increased crystallinity along orthorhombic nature of (040) plane. The Debye-Scherer formula was used to determine the crystallite’s size, which ranged from 20 to 29 nm. The morphological, energy-dispersive X-ray spectroscopy (EDS) and 3D AFM micrographs were characterized to find the morphology and surface roughness of thin film. Optical transmittance spectra (500 nm–1100 nm) revealed that all films had direct band gap values with appropriate range of photo voltaic applications. In the FT-IR spectrum’s absorption band, the characteristic stretching vibration mode of SnS thin films were analysed. The film developed at 325 °C had the lowest electrical resistivity of 4.28 Ω cm with a hole concentration of around 1013 cm−3. As the temperature of growth of the thin film increased, the resistance rapidly reduced.

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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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