Ke Meng, Ruiheng Zheng, Xianrong Gu, Rui Zhang, Lidan Guo, Yang Qin, Tingting Yang, Min Li, Shunhua Hu, Cheng Zhang, Meng Wu, Ankang Guo, Xueli Yang, Jianqi Zhang, Xiangnan Sun
{"title":"利用器件内弹道电子发射光谱准确地现场绘制金属有机半导体界面能级排列图","authors":"Ke Meng, Ruiheng Zheng, Xianrong Gu, Rui Zhang, Lidan Guo, Yang Qin, Tingting Yang, Min Li, Shunhua Hu, Cheng Zhang, Meng Wu, Ankang Guo, Xueli Yang, Jianqi Zhang, Xiangnan Sun","doi":"10.1002/adma.202412758","DOIUrl":null,"url":null,"abstract":"Energy level alignment at metal/organic semiconductors (OSCs) interface governs electronic processes in organic electronics devices, making its precise determination essential for understanding carrier transport behaviors and optimizing device performance. However, it is proven that accurately characterizing the energy barrier at metal/OSC interface under operational conditions remains challenging due to the technical limitations of traditional methods. Herein, through integrating highly‐improved device constructions with an ingenious derivative‐assisted data processing method, this study demonstrates an in‐device ballistic‐electron‐emission spectroscopy using hot‐electron transistors to accurately characterize the energy barrier at metal/OSC interface under in‐operando conditions. This technique is found that a remarkable improvement in measurement accuracy, reaching up to ±0.03 eV, can be achieved—surpassing previous techniques (±0.1–0.2 eV). The high accuracy allows us to monitor subtle changes in energy barriers at metal/OSC interface caused by variations in the aggregation state of OSCs, a phenomenon that is theoretically possible but failed to be directly demonstrated through conventional methods. Moreover, this study makes demonstration that this technology is universally applicable to various metal/OSC interfaces consisting of electron‐transporting, hole‐transporting, and ambipolar OSCs. These findings manifest the great potential of this method to advance both theoretical exploration and technical applications in organic electronics.","PeriodicalId":114,"journal":{"name":"Advanced Materials","volume":null,"pages":null},"PeriodicalIF":27.4000,"publicationDate":"2024-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"In‐Device Ballistic‐Electron‐Emission Spectroscopy for Accurately In Situ Mapping Energy Level Alignment at Metal–Organic Semiconductors Interface\",\"authors\":\"Ke Meng, Ruiheng Zheng, Xianrong Gu, Rui Zhang, Lidan Guo, Yang Qin, Tingting Yang, Min Li, Shunhua Hu, Cheng Zhang, Meng Wu, Ankang Guo, Xueli Yang, Jianqi Zhang, Xiangnan Sun\",\"doi\":\"10.1002/adma.202412758\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Energy level alignment at metal/organic semiconductors (OSCs) interface governs electronic processes in organic electronics devices, making its precise determination essential for understanding carrier transport behaviors and optimizing device performance. However, it is proven that accurately characterizing the energy barrier at metal/OSC interface under operational conditions remains challenging due to the technical limitations of traditional methods. Herein, through integrating highly‐improved device constructions with an ingenious derivative‐assisted data processing method, this study demonstrates an in‐device ballistic‐electron‐emission spectroscopy using hot‐electron transistors to accurately characterize the energy barrier at metal/OSC interface under in‐operando conditions. This technique is found that a remarkable improvement in measurement accuracy, reaching up to ±0.03 eV, can be achieved—surpassing previous techniques (±0.1–0.2 eV). The high accuracy allows us to monitor subtle changes in energy barriers at metal/OSC interface caused by variations in the aggregation state of OSCs, a phenomenon that is theoretically possible but failed to be directly demonstrated through conventional methods. Moreover, this study makes demonstration that this technology is universally applicable to various metal/OSC interfaces consisting of electron‐transporting, hole‐transporting, and ambipolar OSCs. 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In‐Device Ballistic‐Electron‐Emission Spectroscopy for Accurately In Situ Mapping Energy Level Alignment at Metal–Organic Semiconductors Interface
Energy level alignment at metal/organic semiconductors (OSCs) interface governs electronic processes in organic electronics devices, making its precise determination essential for understanding carrier transport behaviors and optimizing device performance. However, it is proven that accurately characterizing the energy barrier at metal/OSC interface under operational conditions remains challenging due to the technical limitations of traditional methods. Herein, through integrating highly‐improved device constructions with an ingenious derivative‐assisted data processing method, this study demonstrates an in‐device ballistic‐electron‐emission spectroscopy using hot‐electron transistors to accurately characterize the energy barrier at metal/OSC interface under in‐operando conditions. This technique is found that a remarkable improvement in measurement accuracy, reaching up to ±0.03 eV, can be achieved—surpassing previous techniques (±0.1–0.2 eV). The high accuracy allows us to monitor subtle changes in energy barriers at metal/OSC interface caused by variations in the aggregation state of OSCs, a phenomenon that is theoretically possible but failed to be directly demonstrated through conventional methods. Moreover, this study makes demonstration that this technology is universally applicable to various metal/OSC interfaces consisting of electron‐transporting, hole‐transporting, and ambipolar OSCs. These findings manifest the great potential of this method to advance both theoretical exploration and technical applications in organic electronics.
期刊介绍:
Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.